The durability of grazing- and normal-incidence optical coatings has been experimentally assessed under free-electron laser irradiation at various numbers of pulses up to 16 million shots and various fluence levels below 10% of the single-shot damage threshold. The experiment was performed at FLASH, the Free-electron LASer in Hamburg, using 13.5 nm extreme UV (EUV) radiation with 100 fs pulse duration. Polycrystalline ruthenium and amorphous carbon 50 nm thin films on silicon substrates were tested at total external reflection angles of 20° and 10° grazing incidence, respectively. Mo/Si periodical multilayer structures were tested in the Bragg reflection condition at 16° off-normal angle of incidence. The exposed areas were analysed post-mo...
The IMPACT (Interaction of Materials with charged Particles And Components Testing) experiment at Ar...
The stability of Mo/Si multilayer mirrors under extreme ultraviolet (EUV) radiations has been invest...
The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond XUV free ...
The durability of grazing- and normal-incidence optical coatings has been experimentally assessed un...
The durability of grazing and normal incidence optical coatings has been experimentally assessed u...
The durability of grazing and normal incidence optical coatings has been experimentally assessed u...
The durability of grazing and normal incidence optical coatings has been experimentally assessed u...
We studied 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiatio...
We present 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiatio...
The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performa...
The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond extreme u...
We exposed standard Mo/Si multilayer coatings, optimized for 13.5 nm radiation to the intense femtos...
Extreme ultraviolet lithography (EUVL) is a next generation photolithographic technique that uses 13...
Extreme Ultraviolet Lithography (EUVL) is a candidate for future application by the semiconductor in...
The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond XUV free ...
The IMPACT (Interaction of Materials with charged Particles And Components Testing) experiment at Ar...
The stability of Mo/Si multilayer mirrors under extreme ultraviolet (EUV) radiations has been invest...
The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond XUV free ...
The durability of grazing- and normal-incidence optical coatings has been experimentally assessed un...
The durability of grazing and normal incidence optical coatings has been experimentally assessed u...
The durability of grazing and normal incidence optical coatings has been experimentally assessed u...
The durability of grazing and normal incidence optical coatings has been experimentally assessed u...
We studied 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiatio...
We present 1-on-1 and 10-on-1 damage threshold investigations on Mo/Si multilayers with EUV radiatio...
The effect of energetic Xenon ion bombardment on the extreme ultraviolet (EUV) reflectivity performa...
The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond extreme u...
We exposed standard Mo/Si multilayer coatings, optimized for 13.5 nm radiation to the intense femtos...
Extreme ultraviolet lithography (EUVL) is a next generation photolithographic technique that uses 13...
Extreme Ultraviolet Lithography (EUVL) is a candidate for future application by the semiconductor in...
The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond XUV free ...
The IMPACT (Interaction of Materials with charged Particles And Components Testing) experiment at Ar...
The stability of Mo/Si multilayer mirrors under extreme ultraviolet (EUV) radiations has been invest...
The process of damage accumulation in thin ruthenium films exposed to multiple femtosecond XUV free ...