We performed a comprehensive study on the electrochromism in TiO2 thin films made by reactive DC magnetron sputtering and elucidated the roles of sputter gas pressure p, O-2/Ar gas ratio gamma and substrate temperature tau(s). Good mid-luminous optical modulation taken to be similar to 50% in similar to 200-nm-thick films was obtained under charge exchange in a Li+ electrolyte for p > 15 mTorr and tau(s) < 100 degrees C, whereas gamma was less important. The deposition rate dropped for increasing p, and hence p approximate to 15 mTorr was optimal. These films were X-ray amorphous and contained some water. The coloration efficiency eta was 25 cm(2)/C, which exceeds data on eta in most prior studies on sputter deposited TiO2 and verifie...
The mid-frequency (20-350 kHz) pulsed magnetron sputtering process has been reported as an enabling ...
Titanium dioxide in its anatase form may react with lithium by a reversible intercalation process. T...
Titanium dioxide thin films were deposited on silicon (111) and glass substrates by using direct cur...
We performed a comprehensive study on the electrochromism in TiO2 thin films made by reactive DC mag...
AbstractTiO2 thin films were deposited by DC reactive magnetron sputtering technique on silicon wafe...
Recently, there has been increasing interest in the application of TiO2 in electrochromic devices. H...
This paper deals with the reactive sputtering of titanium in an argon and oxygen mixture. The variat...
TiO2 thin films were deposited on unheated silicon wafers (100) and glass slides by a pulsed DC reac...
TiO2 thin films were deposited through a d. c. magnetron sputtering method. An analysis of the optic...
Titanium oxide (TiO2) thin films have been deposited onto highly cleaned soda lime glass substrates...
The state of the art to obtain crystalline TiO2 layers by vacuum deposition methods is the use of el...
Titanium oxide (TiO2) thin films were deposited by DC magnetron sputtering of titanium target at var...
AbstractThe article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO2t...
Thin films of W-Ti oxide were prepared by reactive DC magnetron sputtering and were characterized by...
This paper compares titanium oxide (TiO2) thin films deposited by RF and DC sputtering. Structural c...
The mid-frequency (20-350 kHz) pulsed magnetron sputtering process has been reported as an enabling ...
Titanium dioxide in its anatase form may react with lithium by a reversible intercalation process. T...
Titanium dioxide thin films were deposited on silicon (111) and glass substrates by using direct cur...
We performed a comprehensive study on the electrochromism in TiO2 thin films made by reactive DC mag...
AbstractTiO2 thin films were deposited by DC reactive magnetron sputtering technique on silicon wafe...
Recently, there has been increasing interest in the application of TiO2 in electrochromic devices. H...
This paper deals with the reactive sputtering of titanium in an argon and oxygen mixture. The variat...
TiO2 thin films were deposited on unheated silicon wafers (100) and glass slides by a pulsed DC reac...
TiO2 thin films were deposited through a d. c. magnetron sputtering method. An analysis of the optic...
Titanium oxide (TiO2) thin films have been deposited onto highly cleaned soda lime glass substrates...
The state of the art to obtain crystalline TiO2 layers by vacuum deposition methods is the use of el...
Titanium oxide (TiO2) thin films were deposited by DC magnetron sputtering of titanium target at var...
AbstractThe article reports on low-temperature high-rate sputtering of hydrophilic transparent TiO2t...
Thin films of W-Ti oxide were prepared by reactive DC magnetron sputtering and were characterized by...
This paper compares titanium oxide (TiO2) thin films deposited by RF and DC sputtering. Structural c...
The mid-frequency (20-350 kHz) pulsed magnetron sputtering process has been reported as an enabling ...
Titanium dioxide in its anatase form may react with lithium by a reversible intercalation process. T...
Titanium dioxide thin films were deposited on silicon (111) and glass substrates by using direct cur...