Ar plasma exposure of RTV 655 with mask.
- Firouzeh Sabri (294448)
- Jeffrey G. Marchetta (302773)
- M. Sinden-Redding (302775)
- James J. Habenicht (302777)
- Thien Phung Chung (302779)
- Charles N. Melton (302781)
- Chris J. Hatch (302782)
- Robert L. Lirette (302784)
Publication date
February 2013
DOIAbstract
<p>Argon plasma exposure of RTV 655 sample with a patterned mask (a) followed by the dust chamber exposure step. The mask pattern can be seen clearly (b) highlighting the impact of the Ar plasma treatment step on the dust adhesion behavior of the polymer.</p
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