A thin film semiconductor device was grown by MBE methods, characterized for material quality and evaluated for suitability as a room temperature gamma radiation detector. The objective was to produce a device that was superior to current semiconductor detectors, namely HPGe and CZT which have different limitations due to intrinsic material characteristics. AlSb was chosen because of its desirable properties which include the high atomic number of antimony (Z = 51), relatively large band gap (Eg = 1.6 eV), and theorized high dual carrier mobility. Simulations were performed using MCNP5 to predict energy deposited in AlSb by low energy gammas from Ba-133 and Co-57. A benchmark model was developed using a silicon surface barrier detector ...
Due to its large band gap, AlSb is often used as a barrier in antimonide heterostructure devices. Ho...
Wide bandgap semiconductors are being widely investigated because they have the potential to satisfy...
Structural, optical, and electrical properties of AlSb, AlAs, AlP, AlN, and BN thin films deposited ...
A thin film semiconductor device was grown by MBE methods, characterized for material quality and ev...
Theoretical predictions for AlSb material properties have not been realized using bulk growth method...
Aluminum antimony (AlSb) is an indirect band gap semiconductor with Eg of about 1.62 eV at 300 K and...
The development of high resolution, room temperature semiconductor radiation detectors requires the ...
Growth and Characterization of α-PbO for Room Temperature Radiation Detection byErin Leigh FordDocto...
The ultimate objective of the conducted research is to ascertain the potential of AlSb (in single cr...
The layered III-VI semiconductor Gallium Telluride has potential for room temperature gamma ray spec...
This dissertation is devoted to studying radiation response of the antimonide (Sb)-based detectors a...
Thallium bromide is an attractive material for room-temperature gamma-ray spectroscopy and imaging b...
Since the development of the transistor in the Bell Telephone Laboratories in 1948 [78], the semicon...
Thallium bromide is an attractive material for room-temperature gamma-ray spectroscopy and imaging b...
Thallium-bromide (TlBr), mercury-sulfide (HgS), and mercury-oxide (HgO) detectors have been investig...
Due to its large band gap, AlSb is often used as a barrier in antimonide heterostructure devices. Ho...
Wide bandgap semiconductors are being widely investigated because they have the potential to satisfy...
Structural, optical, and electrical properties of AlSb, AlAs, AlP, AlN, and BN thin films deposited ...
A thin film semiconductor device was grown by MBE methods, characterized for material quality and ev...
Theoretical predictions for AlSb material properties have not been realized using bulk growth method...
Aluminum antimony (AlSb) is an indirect band gap semiconductor with Eg of about 1.62 eV at 300 K and...
The development of high resolution, room temperature semiconductor radiation detectors requires the ...
Growth and Characterization of α-PbO for Room Temperature Radiation Detection byErin Leigh FordDocto...
The ultimate objective of the conducted research is to ascertain the potential of AlSb (in single cr...
The layered III-VI semiconductor Gallium Telluride has potential for room temperature gamma ray spec...
This dissertation is devoted to studying radiation response of the antimonide (Sb)-based detectors a...
Thallium bromide is an attractive material for room-temperature gamma-ray spectroscopy and imaging b...
Since the development of the transistor in the Bell Telephone Laboratories in 1948 [78], the semicon...
Thallium bromide is an attractive material for room-temperature gamma-ray spectroscopy and imaging b...
Thallium-bromide (TlBr), mercury-sulfide (HgS), and mercury-oxide (HgO) detectors have been investig...
Due to its large band gap, AlSb is often used as a barrier in antimonide heterostructure devices. Ho...
Wide bandgap semiconductors are being widely investigated because they have the potential to satisfy...
Structural, optical, and electrical properties of AlSb, AlAs, AlP, AlN, and BN thin films deposited ...