Effective photonic sintering for highly conductive copper nano-ink film using flash white light combined with Deep UV and NIR light irradiation

We developed an ultra-high speed photonic sintering method involving flash white light (FWL) combined with near infrared (NIR) and deep UV light irradiation to produce highly conductive copper nano-ink film. Flash white light irradiation energy and the power of NIR/deep UV were optimized to obtain high conductivity Cu films. Several microscopic and spectroscopic characterization techniques such as scanning electron microscopy (SEM) and a x-ray diffraction (XRD) were employed to characterize the Cu nano-films. Optimally sintered Cu nano-ink films produced using a deep UV-assisted flash white light sintering technique had the lowest resistivity (7.62 μ???·cm), which was only 4.5-fold higher than that of bulk Cu film (1.68 μ???•cm).This research was supported by Basic Science Research Program through the National Research Foundation of Korea(NRF) funded by the Ministry of Education(2012R1A6A1029029). Also, this work was supported by the Technology Innovation Program (or Industrial Strategic technology development program, 10048913, Development of the cheap nano-ink which is sintered in the air for smart devices) funded By the Ministry of Trade, industry & Energy(MI, Korea)