In this paper, we introduced a novel bonding method of glass wafers by Diels-Alder reaction at mild temperature. After standard hydroxylization and aminosilylation, two wafers were modified by 2-furaldehyde and maleic anhydride, respectively. Then they were brought into close contact and tightly held with a clamping fixture. A strong bonding could be achieved by annealing for 5 h at 200 degrees C. Bonding strength is as high as 1.78 MPa and sufficient for most application of microfluidic chips
This paper is focused on a modified process for silicon direct bonding. Thin intermediate sodium sti...
To confirm the uniformity on the whole bonded pair by means of a variety of surface energy testings ...
We report here on the results of experiments concerning particular bonding processes potentially use...
For many years, different methods for bonding glass borofloat substrates have been investigated1, in...
In this paper, we presented a novel covalent bonding process between two quartz wafers at 300 degree...
A bonding process was developed for glass-to-glass fusion bonding using Borofloat 33 wafers, resulti...
Glass-to-glass wafer bonding has recently attracted considerable interest. Especially for liquid man...
In this paper a new class of modified silicon direct bonding processes is presented. The new process...
Itigh strength bonds can be formed between portions of silicon wafer coated with reflowed BPSG at te...
In this paper, we introduce a new bonding technology for the assembly of micro- structured glass sub...
Wafer bonding is an enabling technology in substrate engineering, MEMS manufacturing and packaging a...
A l imitation to the use of direct wafer bonding methods for micromachining and thin film device man...
In microsystems technologies, frequently complex structures consisting of structured or plain silico...
Polyelectrolyte multilayers of just a few nanometers thickness were used for direct bonding of silic...
In this work a novel room-temperature bonding technique based on chemically activated Fluorinated Et...
This paper is focused on a modified process for silicon direct bonding. Thin intermediate sodium sti...
To confirm the uniformity on the whole bonded pair by means of a variety of surface energy testings ...
We report here on the results of experiments concerning particular bonding processes potentially use...
For many years, different methods for bonding glass borofloat substrates have been investigated1, in...
In this paper, we presented a novel covalent bonding process between two quartz wafers at 300 degree...
A bonding process was developed for glass-to-glass fusion bonding using Borofloat 33 wafers, resulti...
Glass-to-glass wafer bonding has recently attracted considerable interest. Especially for liquid man...
In this paper a new class of modified silicon direct bonding processes is presented. The new process...
Itigh strength bonds can be formed between portions of silicon wafer coated with reflowed BPSG at te...
In this paper, we introduce a new bonding technology for the assembly of micro- structured glass sub...
Wafer bonding is an enabling technology in substrate engineering, MEMS manufacturing and packaging a...
A l imitation to the use of direct wafer bonding methods for micromachining and thin film device man...
In microsystems technologies, frequently complex structures consisting of structured or plain silico...
Polyelectrolyte multilayers of just a few nanometers thickness were used for direct bonding of silic...
In this work a novel room-temperature bonding technique based on chemically activated Fluorinated Et...
This paper is focused on a modified process for silicon direct bonding. Thin intermediate sodium sti...
To confirm the uniformity on the whole bonded pair by means of a variety of surface energy testings ...
We report here on the results of experiments concerning particular bonding processes potentially use...