Structural studies reveal that heavy ion bombardment of GaN causes amorphization and anomalous swelling of the implanted region as a result of the formation of a porous structure. Results strongly suggest that such a porous structure consists of N2 gas bubbles embedded into a highly N-deficient amorphous GaN matrix. The evolution of the porous structure in amorphous GaN appears to be a result of stoichiometric imbalance where N- and Ga-rich regions are produced by ion bombardment. Prior to amorphization, ion bombardment does not produce a porous structure due to very efficient dynamic annealing processes in the crystalline phase
GaN epilayers grown by metal organic chemical vapor deposition (MOCVD) were implanted with Tm and Eu...
Group-III-nitride semiconductors (GaN, InGaN, and AlGaN) are important for the fabrication of a rang...
A surface amorphized layer and a buried disordered structure were created in gallium nitride (GaN) i...
Wurtzite GaN films bombarded with heavy ions (Au-197(+)) show anomalous swelling of the implanted re...
We have compared the atomic-scale structure of ion irradiated GaN to that of amorphised GaP and GaAs...
Wurtzite undoped GaN epilayers (0 0 0 1) was implanted with 500 keV Au(+) ions at room temperature u...
Damage evaluation processes in patterned GaN implanted by 3 MeV Au 2+ ions were investigated as a fu...
The damage buildup until amorphization in wurtzite GaN films under kev light (12C) and heavy (197Au)...
The structural characteristics of wurtzite GaN films bombarded up to high ion doses are studied by a...
The effects of elevated-temperature ion bombardment of wurtzite GaN films preamorphized by ion impla...
This paper deals with the results of a systematic investigation of damage generation and accumulatio...
Wurtzite GaN epilayers bombarded with a wide range of ion species (10 keV H-1, 40 keV C-12, 50 keV O...
Wurtzite GaN can be rendered amorphous by high-dose heavy-ion bombardment. We show here that relativ...
Damage and microstructure evolution in gallium nitride (GaN) under Au(+) ion irradiation has been in...
The effects of elevated-temperature ion bombardment of wurtzite GaN films preamorphized by ion impla...
GaN epilayers grown by metal organic chemical vapor deposition (MOCVD) were implanted with Tm and Eu...
Group-III-nitride semiconductors (GaN, InGaN, and AlGaN) are important for the fabrication of a rang...
A surface amorphized layer and a buried disordered structure were created in gallium nitride (GaN) i...
Wurtzite GaN films bombarded with heavy ions (Au-197(+)) show anomalous swelling of the implanted re...
We have compared the atomic-scale structure of ion irradiated GaN to that of amorphised GaP and GaAs...
Wurtzite undoped GaN epilayers (0 0 0 1) was implanted with 500 keV Au(+) ions at room temperature u...
Damage evaluation processes in patterned GaN implanted by 3 MeV Au 2+ ions were investigated as a fu...
The damage buildup until amorphization in wurtzite GaN films under kev light (12C) and heavy (197Au)...
The structural characteristics of wurtzite GaN films bombarded up to high ion doses are studied by a...
The effects of elevated-temperature ion bombardment of wurtzite GaN films preamorphized by ion impla...
This paper deals with the results of a systematic investigation of damage generation and accumulatio...
Wurtzite GaN epilayers bombarded with a wide range of ion species (10 keV H-1, 40 keV C-12, 50 keV O...
Wurtzite GaN can be rendered amorphous by high-dose heavy-ion bombardment. We show here that relativ...
Damage and microstructure evolution in gallium nitride (GaN) under Au(+) ion irradiation has been in...
The effects of elevated-temperature ion bombardment of wurtzite GaN films preamorphized by ion impla...
GaN epilayers grown by metal organic chemical vapor deposition (MOCVD) were implanted with Tm and Eu...
Group-III-nitride semiconductors (GaN, InGaN, and AlGaN) are important for the fabrication of a rang...
A surface amorphized layer and a buried disordered structure were created in gallium nitride (GaN) i...