Application of nsPEFs to single cells.

<p>(A) The nsPEF exposure and imaging experimental set-up. An EC Plan-Neofluar 40×/1.3 DIC-oil Zeiss objective was used with the Zeiss LSM 710 microscope to image CHO-K1 cells, plated in a MatTek imaging plate, centered between the tungsten electrodes. The load resistor, R = 50 W. (B) Traces of the nsEP delivered by the system are shown as captured by a 500 MHz Tektronix oscilloscope connected across the load resistor. (C) A transverse section of the FDTD model for the tungsten electrode exposure system at 50 µm above the glass surface predicting an electric field of 2.3 MV/m at the cell for a 500V pulse amplitude.