Single electron transport through multiple quantum levels is realized in a Si quantum-dot device at room-temperature conditions. The energy spacing of more than triple the omnipresent thermal energy is obtained from an extremely small ellipsoidal Si quantum dot, and high charge stability is attained through a construction of the gate-all-around structure. These properties may move us a step closer to practical applications of quantum devices at elevated temperatures. An in-depth analysis on the transport behavior and quantum structure is presented
This report describes experimental work performed on highly phosphorous doped silicon single electro...
We present an electrostatically defined few-electron double quantum dot (QD) realized in a molecular...
This thesis describes the development and demonstration of a new technique for the fabrication of we...
Single nanometre scale quantum dots (QDs) have significant potential for many 'beyond CMOS' nanoelec...
The high-performance room-temperature-operating Si single-electron transistors (SETs) were devised i...
A few-electron double quantum dot was fabricated usingmetal-oxide-semiconductor-compatible technolog...
We report on electron transport measurements of a lithographically-defined silicon double quantum do...
Single-electron transistors (SETs) in silicon (Si), where charge can be controlled at the one electr...
A novel technique has been developed for the fabrication of Si quantum dot structures with controlla...
We report on single-electron shuttling experiments with a silicon metal-oxide-semiconductor quantum ...
We report on single-electron shuttling experiments with a silicon metal-oxide-semiconductor quantum ...
Electrical operation of room-temperature (RT) single dopant atom quantum dot (QD) transistors, based...
The fabrication of high-performance solid-state silicon quantum-devices requires high resolution pat...
We report on electron transport measurements of a lithographically-defined silicon double quantum do...
We present the fabrication and low-temperature electron transport measurements of circuits consistin...
This report describes experimental work performed on highly phosphorous doped silicon single electro...
We present an electrostatically defined few-electron double quantum dot (QD) realized in a molecular...
This thesis describes the development and demonstration of a new technique for the fabrication of we...
Single nanometre scale quantum dots (QDs) have significant potential for many 'beyond CMOS' nanoelec...
The high-performance room-temperature-operating Si single-electron transistors (SETs) were devised i...
A few-electron double quantum dot was fabricated usingmetal-oxide-semiconductor-compatible technolog...
We report on electron transport measurements of a lithographically-defined silicon double quantum do...
Single-electron transistors (SETs) in silicon (Si), where charge can be controlled at the one electr...
A novel technique has been developed for the fabrication of Si quantum dot structures with controlla...
We report on single-electron shuttling experiments with a silicon metal-oxide-semiconductor quantum ...
We report on single-electron shuttling experiments with a silicon metal-oxide-semiconductor quantum ...
Electrical operation of room-temperature (RT) single dopant atom quantum dot (QD) transistors, based...
The fabrication of high-performance solid-state silicon quantum-devices requires high resolution pat...
We report on electron transport measurements of a lithographically-defined silicon double quantum do...
We present the fabrication and low-temperature electron transport measurements of circuits consistin...
This report describes experimental work performed on highly phosphorous doped silicon single electro...
We present an electrostatically defined few-electron double quantum dot (QD) realized in a molecular...
This thesis describes the development and demonstration of a new technique for the fabrication of we...