Effects of a magnetic field (≤0.5 T) on electroless copper metal deposition from the reaction of a copper sulfate aqueous solution and a zinc thin plate were examined in this study. In a zero field, a smooth copper thin film grew steadily on the plate. In a 0.38 T field, a smooth copper thin film deposited on a zinc plate within about 1 min. Then, it peeled off repeatedly from the plate. The yield of consumed copper ions increased about 2.1 times compared with that in a zero field. Mechanism of this magnetic field effect was discussed in terms of Lorentz force- and magnetic force-induced convection and local volta cell formation
Abstract- The influence of magnetic field on some kinetic crystallization parameters of the systems ...
The paper presents a study of the effect of constant magnetic field (CMF) on the basic processes of ...
Co100−xFex (x = 0; 50; 30; 20) films are prepared by pulse-reverse plating onto Cu foils, in the pre...
THESIS 6363The effect of a static magnetic field on the electrodeposition and electrodissolution of ...
The effect of a magnetic field on copper electrodeposition was investigated. Copper was electrodepos...
THESIS 9531Industrial processes involving copper electrolysis are important in modern society. In th...
Magnetic fields parallel to electrodes were introduced during plating process to prepare cobalt film...
Introduction. The influence of magnetic fields up to µ0H = 1 T differently aligned to the electrode ...
THESIS 7756The association of magnetism and electrodeposition is studied from two separate perspecti...
Fe and Co films were galvanostatically electrodeposited at 10 mA cm-2 on Cu substrate in sulfate aqu...
The effects of an applied magnetic field of up to 5 T on hydrogen evolution and cathodic overpotenti...
A uniform magnetic field unexpectedly alters the form of copper deposits grown in a flat electroche...
A new method with MHD electrode (MHDE) to analyze the electrochemical reaction under the magnetic fi...
The electrodeposition of copper in the presence of a magnetic field has previously been shown to aff...
of a Magnetic Field The effect of an electromagnetic field (EMF) on the rate of copper(II) cementati...
Abstract- The influence of magnetic field on some kinetic crystallization parameters of the systems ...
The paper presents a study of the effect of constant magnetic field (CMF) on the basic processes of ...
Co100−xFex (x = 0; 50; 30; 20) films are prepared by pulse-reverse plating onto Cu foils, in the pre...
THESIS 6363The effect of a static magnetic field on the electrodeposition and electrodissolution of ...
The effect of a magnetic field on copper electrodeposition was investigated. Copper was electrodepos...
THESIS 9531Industrial processes involving copper electrolysis are important in modern society. In th...
Magnetic fields parallel to electrodes were introduced during plating process to prepare cobalt film...
Introduction. The influence of magnetic fields up to µ0H = 1 T differently aligned to the electrode ...
THESIS 7756The association of magnetism and electrodeposition is studied from two separate perspecti...
Fe and Co films were galvanostatically electrodeposited at 10 mA cm-2 on Cu substrate in sulfate aqu...
The effects of an applied magnetic field of up to 5 T on hydrogen evolution and cathodic overpotenti...
A uniform magnetic field unexpectedly alters the form of copper deposits grown in a flat electroche...
A new method with MHD electrode (MHDE) to analyze the electrochemical reaction under the magnetic fi...
The electrodeposition of copper in the presence of a magnetic field has previously been shown to aff...
of a Magnetic Field The effect of an electromagnetic field (EMF) on the rate of copper(II) cementati...
Abstract- The influence of magnetic field on some kinetic crystallization parameters of the systems ...
The paper presents a study of the effect of constant magnetic field (CMF) on the basic processes of ...
Co100−xFex (x = 0; 50; 30; 20) films are prepared by pulse-reverse plating onto Cu foils, in the pre...