The effect of ion species on the damage buildup behavior in wurtzite GaN under bombardment at liquid nitrogen temperature (LN2) is studied by a combination of Rutherford backscattering/channeling spectrometry and transmission electron microscopy. Results show that both the density of collision cascades and chemical effects of implanted species affect the damage buildup behavior during bombardment at LN2. In particular, an increase in the density of collision cascades (with increasing ion mass) strongly enhances the level of pre-amorphous lattice disorder in the crystal bulk at LN2, which is similar to the situation during bombardment at room temperature. (C) 2002 Elsevier Science B.V. All rights reserved
Ion-produced lattice disorder-often an undesirable effect of ion implantation-can be reduced if impl...
The medium range implantation of rare earth ions at room temperature in GaN layers leads to the form...
GaN epilayers grown by metal organic chemical vapor deposition (MOCVD) were implanted with Tm and Eu...
The effect of ion species on the damage buildup behavior in wurtzite GaN under bombardment at liquid...
The effects of implant conditions on the damage build-up in wurtzite GaN films are studied by Ruther...
The damage buildup until amorphization in wurtzite GaN films under kev light (12C) and heavy (197Au)...
The structural characteristics of wurtzite GaN films bombarded up to high ion doses are studied by a...
Wurtzite GaN epilayers bombarded with a wide range of ion species (10 keV H-1, 40 keV C-12, 50 keV O...
Damage accumulation in wurtzite GaN films bombarded with 0.5 MeV Bi₁ and 1 MeV Bi₂ ions (the so-call...
The effects of elevated-temperature ion bombardment of wurtzite GaN films preamorphized by ion impla...
This paper deals with the results of a systematic investigation of damage generation and accumulatio...
International audienceA detailed investigation of the crystallographic damage has been carried out i...
GaN is implanted with 90 keV Mg-ions and afterwards annealed at 1150°C in a rapid thermal annealing ...
The effects of elevated-temperature ion bombardment of wurtzite GaN films preamorphized by ion impla...
Ion channeling and cross-sectional transmission electron microscopy were used to study the extent an...
Ion-produced lattice disorder-often an undesirable effect of ion implantation-can be reduced if impl...
The medium range implantation of rare earth ions at room temperature in GaN layers leads to the form...
GaN epilayers grown by metal organic chemical vapor deposition (MOCVD) were implanted with Tm and Eu...
The effect of ion species on the damage buildup behavior in wurtzite GaN under bombardment at liquid...
The effects of implant conditions on the damage build-up in wurtzite GaN films are studied by Ruther...
The damage buildup until amorphization in wurtzite GaN films under kev light (12C) and heavy (197Au)...
The structural characteristics of wurtzite GaN films bombarded up to high ion doses are studied by a...
Wurtzite GaN epilayers bombarded with a wide range of ion species (10 keV H-1, 40 keV C-12, 50 keV O...
Damage accumulation in wurtzite GaN films bombarded with 0.5 MeV Bi₁ and 1 MeV Bi₂ ions (the so-call...
The effects of elevated-temperature ion bombardment of wurtzite GaN films preamorphized by ion impla...
This paper deals with the results of a systematic investigation of damage generation and accumulatio...
International audienceA detailed investigation of the crystallographic damage has been carried out i...
GaN is implanted with 90 keV Mg-ions and afterwards annealed at 1150°C in a rapid thermal annealing ...
The effects of elevated-temperature ion bombardment of wurtzite GaN films preamorphized by ion impla...
Ion channeling and cross-sectional transmission electron microscopy were used to study the extent an...
Ion-produced lattice disorder-often an undesirable effect of ion implantation-can be reduced if impl...
The medium range implantation of rare earth ions at room temperature in GaN layers leads to the form...
GaN epilayers grown by metal organic chemical vapor deposition (MOCVD) were implanted with Tm and Eu...