Large-Area Synthesis of High-Quality Uniform Few-Layer MoTe₂

The controlled synthesis of large-area, atomically thin molybdenum ditelluride (MoTe₂) crystals is crucial for its various applications based on the attractive properties of this emerging material. In this work, we developed a chemical vapor deposition synthesis to produce large-area, uniform, and highly crystalline few-layer 2H and 1T′ MoTe₂ films. It was found that these two different phases of MoTe₂ can be grown depending on the choice of Mo precursor. Because of the highly crystalline structure, the as-grown few-layer 2H MoTe₂ films display electronic properties that are comparable to those of mechanically exfoliated MoTe₂ flakes. Our growth method paves the way for the large-scale application of MoTe₂ in high-performance nanoelectronics and optoelectronics