Fundamental understanding of the self-assembly of domains in block copolymers (BCPs) and capabilities in control of these processes are important for their use as nanoscale templates in various applications. This paper focuses on the self-assembly of spin-cast and printed poly(styrene-<i>block</i>-methyl methacrylate) BCPs on patterned surface wetting layers formed by electrohydrodynamic jet printing of random copolymer brushes. Here, end-grafted brushes that present groups of styrene and methyl methacrylate in geometries with nanoscale resolution deterministically define the morphologies of BCP nanostructures. The materials and methods can also be integrated with lithographically defined templates for directed self-assembly of BCPs at mult...
We have studied the wetting and self-assembly behavior of block copolymer thin films on chemical pat...
Lamellae-forming polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) films, with bulk period L-0...
This paper reports an approach for patterning substrates on the nanoscale using a block copolymer, p...
Fundamental understanding of the self-assembly of domains in block copolymers (BCPs) and capabilitie...
Provided are methods of patterning block copolymer (BCP) films with independent control of the size,...
Self-assembly of block-copolymers provides a route to the fabrication of small (size, <50 nm) and de...
We present a high-throughput and inexpensive fabrication approach that uses self-assembled block cop...
We present a high-throughput and inexpensive fabrication approach that uses self-assembled block cop...
lock copolymers (BCPs) can self-assemble to form dense, nanoscale patterns as templates for applica-...
Control over the orientation of cylindrical and lamellar domains is required for pattern transfer in...
This article presents a soft lithographic approach using block copolymer (BCP) films to fabricate fu...
High-density and high-resolution line and space patterns on surfaces are obtained by directed self-a...
We present a versatile method for fabricating nanopatterned polymer brushes using a cross-linked thi...
We report a method for the directed self-assembly (DSA) of block copolymers (BCPs) in which a first ...
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Materials Science and Engineeri...
We have studied the wetting and self-assembly behavior of block copolymer thin films on chemical pat...
Lamellae-forming polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) films, with bulk period L-0...
This paper reports an approach for patterning substrates on the nanoscale using a block copolymer, p...
Fundamental understanding of the self-assembly of domains in block copolymers (BCPs) and capabilitie...
Provided are methods of patterning block copolymer (BCP) films with independent control of the size,...
Self-assembly of block-copolymers provides a route to the fabrication of small (size, <50 nm) and de...
We present a high-throughput and inexpensive fabrication approach that uses self-assembled block cop...
We present a high-throughput and inexpensive fabrication approach that uses self-assembled block cop...
lock copolymers (BCPs) can self-assemble to form dense, nanoscale patterns as templates for applica-...
Control over the orientation of cylindrical and lamellar domains is required for pattern transfer in...
This article presents a soft lithographic approach using block copolymer (BCP) films to fabricate fu...
High-density and high-resolution line and space patterns on surfaces are obtained by directed self-a...
We present a versatile method for fabricating nanopatterned polymer brushes using a cross-linked thi...
We report a method for the directed self-assembly (DSA) of block copolymers (BCPs) in which a first ...
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Materials Science and Engineeri...
We have studied the wetting and self-assembly behavior of block copolymer thin films on chemical pat...
Lamellae-forming polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) films, with bulk period L-0...
This paper reports an approach for patterning substrates on the nanoscale using a block copolymer, p...