Size and Surface Chemistry Tuning of Silicon Carbide Nanoparticles

Chemical transformations on the surface of commercially available 3C-SiC nanoparticles were studied by means of FTIR, XPS, and temperature-programmed desorption mass spectrometry methods. Thermal oxidation of SiC NPs resulted in the formation of a hydroxylated SiO₂ surface layer with C₃Si–H and CH_<i>x</i> groups over the SiO₂/SiC interface. Controllable oxidation followed by oxide dissolution in HF or KOH solution allowed the SiC NPs size tuning from 17 to 9 nm. Oxide-free SiC surfaces, terminated by hydroxyls and C₃Si–H groups, can be efficiently functionalized by alkenes under thermal or photochemical initiation. Treatment of SiC NPs by HF/HNO₃ mixture produces a carbon-enriched surface layer with carboxylic acid groups susceptible to amide chemistry functionalization. The hydroxylated, carboxylated, and aminated SiC NPs form stable aqueous sols