Inverse Resistance Change Cr₂Ge₂Te₆‑Based PCRAM Enabling Ultralow-Energy Amorphization

Phase-change random access memory (PCRAM) has attracted much attention for next-generation nonvolatile memory that can replace flash memory and can be used for storage-class memory. Generally, PCRAM relies on the change in the electrical resistance of a phase-change material between high-resistance amorphous (<i>reset</i>) and low-resistance crystalline (<i>set</i>) states. Herein, we present an inverse resistance change PCRAM with Cr₂Ge₂Te₆ (CrGT) that shows a high-resistance crystalline <i>reset</i> state and a low-resistance amorphous <i>set</i> state. The inverse resistance change was found to be due to a drastic decrease in the carrier density upon crystallization, which causes a large increase in contact resistivity between CrGT and the electrode. The CrGT memory cell was demonstrated to show fast reversible resistance switching with a much lower operating energy for amorphization than a Ge₂Sb₂Te₅ memory cell. This low operating energy in CrGT should be due to a small programmed amorphous volume, which can be realized by a high-resistance crystalline matrix and a dominant contact resistance. Simultaneously, CrGT can break the trade-off relationship between the crystallization temperature and operating speed