This paper presents modeling and experimental results of the voltage, current, and density profiles of a helical resonator plasma source. The source has a 5/4-wavelength (lambda) helical resonator structure with the helical coil short-circuited at one end and open circuited at the other end. When the radio frequency (RF) tap for power feeding was located at an odd multiple of lambda/4 from the short circuited end, the observed voltage, current, and plasma density were higher in the short-circuited section than those in the open-circuited section. The opposite property was observed with the RF tap at an even multiple of lambda/4, A microstrip transmission line model was used to explain the experimental results. The model accurately predicted...
Radio frequency inductively coupled plasma sources are widely used in low temperature industrial pro...
The rf power deposition in helicon discharges generated through helical antennas depends sensitively...
The magnetic pole enhanced inductively coupled source (MaPE-ICP) is an innovative low-pressure plasm...
Modeling and measurement results of the RF input impedance of a helical resonator discharge are give...
The helical resonator is a scheme for the production of high voltage at radio frequency, useful for ...
[[abstract]]We report the results of experimental studies of an inductively coupled plasma (ICP) sou...
Since Helicon plasma sources can efficiently couple power and generate high-density plasma, they hav...
We have also been developing a plasma-wall interaction (PWI) simulator of which plasma source is a s...
The number of antenna coil turns, N, that affects the plasma density is a significant factor to desi...
[[abstract]]The characteristics of a low pressure inductively-coupled plasma (ICP) source which empl...
We have developed a cylindrical RF plasma source by the inductive coupling of multiple low-inductanc...
The performance of the 500 KHz planar-coil inductively coupled plasma source was studied. The global...
Large volume helicon plasma sources are of particular interest for large scale semiconductor process...
With an enlargement of the wafer size, development of large-area plasma sources and control of plasm...
The results of comprehensive experimental studies of the operation, stability, and plasma parameters...
Radio frequency inductively coupled plasma sources are widely used in low temperature industrial pro...
The rf power deposition in helicon discharges generated through helical antennas depends sensitively...
The magnetic pole enhanced inductively coupled source (MaPE-ICP) is an innovative low-pressure plasm...
Modeling and measurement results of the RF input impedance of a helical resonator discharge are give...
The helical resonator is a scheme for the production of high voltage at radio frequency, useful for ...
[[abstract]]We report the results of experimental studies of an inductively coupled plasma (ICP) sou...
Since Helicon plasma sources can efficiently couple power and generate high-density plasma, they hav...
We have also been developing a plasma-wall interaction (PWI) simulator of which plasma source is a s...
The number of antenna coil turns, N, that affects the plasma density is a significant factor to desi...
[[abstract]]The characteristics of a low pressure inductively-coupled plasma (ICP) source which empl...
We have developed a cylindrical RF plasma source by the inductive coupling of multiple low-inductanc...
The performance of the 500 KHz planar-coil inductively coupled plasma source was studied. The global...
Large volume helicon plasma sources are of particular interest for large scale semiconductor process...
With an enlargement of the wafer size, development of large-area plasma sources and control of plasm...
The results of comprehensive experimental studies of the operation, stability, and plasma parameters...
Radio frequency inductively coupled plasma sources are widely used in low temperature industrial pro...
The rf power deposition in helicon discharges generated through helical antennas depends sensitively...
The magnetic pole enhanced inductively coupled source (MaPE-ICP) is an innovative low-pressure plasm...