Low temperature nucleation of GaN on (0001) sapphire is investigated. Depositions were made for 20 s, 40 s, 60 s, 120 s and 180 s at 500degreesC by MOCVD. It is shown that the shortest deposition times give rise to the formation of small cubic crystallites. Subsequently, the density of nucleation islands increases, they grow in height and their shape is modified. They start to transform to wurtzite from the interface with the substrate. These results will be discussed in terms of the operating nucleation and growth mechanisms.X11sci
The influence of hydrogen and nitrogen carrier gases used during the preparation of the nucleation l...
We have studied the growth of gallium nitride on c-plane sapphire substrates. The layers were grown ...
<font face="times new roman,times" size="2">In situ optical reflectivity measurements are employed t...
The morphology and microstructural evolution of a nucleation layer are analysed using high-resolutio...
GaN nucleation layers were grown on sapphire substrate by metal organic chemical vapor deposition (M...
Predominately hexagonal GaN nucleation layers were grown on sapphire substrate by low pressure metal...
The structural characteristic of cubic GaN (C-GaN) nucleation layers on GaAs(0 0 1) substrates by me...
The morphological evolution of GaN thin films grown on sapphire by metalorganic chemical vapor depos...
Low-pressure metal-organic chemical vapor deposition (MOCVD) has been used to deposit unnucleated an...
[[abstract]]We investigated the structural evolution of GaN nucleation layers in the initial growth ...
The influence of reactor pressure on GaN nucleation layer (NL) and the quality of subsequent GaN on ...
Thick GaN films were grown on sapphire in a home-made vertical HVPE reactor. Effect of nucleation tr...
Abstract: Nucleation layer formation is a key factor for high quality gallium nitride (GaN) growth o...
International audienceGaN/sapphire layers have been grown by Metal Organic Vapour Phase Epitaxy (MOV...
Nitridation of sapphire substrates is used as a precursor to the growth of GaN films to provide a we...
The influence of hydrogen and nitrogen carrier gases used during the preparation of the nucleation l...
We have studied the growth of gallium nitride on c-plane sapphire substrates. The layers were grown ...
<font face="times new roman,times" size="2">In situ optical reflectivity measurements are employed t...
The morphology and microstructural evolution of a nucleation layer are analysed using high-resolutio...
GaN nucleation layers were grown on sapphire substrate by metal organic chemical vapor deposition (M...
Predominately hexagonal GaN nucleation layers were grown on sapphire substrate by low pressure metal...
The structural characteristic of cubic GaN (C-GaN) nucleation layers on GaAs(0 0 1) substrates by me...
The morphological evolution of GaN thin films grown on sapphire by metalorganic chemical vapor depos...
Low-pressure metal-organic chemical vapor deposition (MOCVD) has been used to deposit unnucleated an...
[[abstract]]We investigated the structural evolution of GaN nucleation layers in the initial growth ...
The influence of reactor pressure on GaN nucleation layer (NL) and the quality of subsequent GaN on ...
Thick GaN films were grown on sapphire in a home-made vertical HVPE reactor. Effect of nucleation tr...
Abstract: Nucleation layer formation is a key factor for high quality gallium nitride (GaN) growth o...
International audienceGaN/sapphire layers have been grown by Metal Organic Vapour Phase Epitaxy (MOV...
Nitridation of sapphire substrates is used as a precursor to the growth of GaN films to provide a we...
The influence of hydrogen and nitrogen carrier gases used during the preparation of the nucleation l...
We have studied the growth of gallium nitride on c-plane sapphire substrates. The layers were grown ...
<font face="times new roman,times" size="2">In situ optical reflectivity measurements are employed t...