Ti-A-C-Ag (A is Si, Ge or Sn) nanocomposite coatings have been deposited by dc magnetron sputtering in an ultra high vacuum chamber. Electron microscopy, energy-dispersive x-ray spectroscopy, xray photoelectron spectroscopy, and x-ray diffraction show that all coatings contain nanocrystalline TiC and Ag grains in a matrix of mainly amorphous C. A C/Ti ratio above unity yields a homogenous distribution of Ag with a reduced grain size. From a chemical point of view, the addition of Ge and Sn to the Ti-C-Ag system should increase the conductivity of the coatings since the formation of more metallic phases than Si. We demonstrate that Si can be replaced with Ge and Sn and still yield a homogeneous distribution of Ag. The incorporation of Ge and...
We have synthesized Ti–Si–C nanocomposite thin films by dc magnetron sputtering from a Ti3SiC2 compo...
This contribution deals with fundamental and applied concepts in nano-structured coatings, in partic...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
Ti-A-C-Ag (A is Si, Ge or Sn) nanocomposite coatings have been deposited by dc magnetron sputtering ...
Ti-B-C nanocomposite coatings with a B content of 8-17 at.% have been deposited by magnetron sputter...
Amorphous (a) and nanocomposite Ti–Si–C coatings were deposited at rates up to 16 μm/h by direct cur...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
The content of the individual elements in the nanocomposite hard multicomponent coatings is known to...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
Nanocomposite Ti–Si–N coatings were prepared by reactive dc magnetron sputtering in a mixture of Ar...
TiSiCN and TiAlVSiCN coatings were deposited by pulsed dc magnetron sputtering of a pure Ti target a...
An ambitious objective in the development of self-lubricating wear-resistant coatings is to make use...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Superhard coatings (hardness > 20 GPa) are being widely researched, driven by the need to use the co...
This contribution deals with fundamental and applied concepts in nano-structured coatings, in partic...
We have synthesized Ti–Si–C nanocomposite thin films by dc magnetron sputtering from a Ti3SiC2 compo...
This contribution deals with fundamental and applied concepts in nano-structured coatings, in partic...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...
Ti-A-C-Ag (A is Si, Ge or Sn) nanocomposite coatings have been deposited by dc magnetron sputtering ...
Ti-B-C nanocomposite coatings with a B content of 8-17 at.% have been deposited by magnetron sputter...
Amorphous (a) and nanocomposite Ti–Si–C coatings were deposited at rates up to 16 μm/h by direct cur...
In this paper Ti-Si-N nanocomposite coatings were prepared by reactive magnetron sputtering on to di...
The content of the individual elements in the nanocomposite hard multicomponent coatings is known to...
A d.c. reactive magnetron sputtering technique was used to deposit (Ti, Si, Al)N films. The ion curr...
Nanocomposite Ti–Si–N coatings were prepared by reactive dc magnetron sputtering in a mixture of Ar...
TiSiCN and TiAlVSiCN coatings were deposited by pulsed dc magnetron sputtering of a pure Ti target a...
An ambitious objective in the development of self-lubricating wear-resistant coatings is to make use...
In this work (Ti,Si,Al)N films were deposited using only rf or a combination of rf and d.c. reactive...
Superhard coatings (hardness > 20 GPa) are being widely researched, driven by the need to use the co...
This contribution deals with fundamental and applied concepts in nano-structured coatings, in partic...
We have synthesized Ti–Si–C nanocomposite thin films by dc magnetron sputtering from a Ti3SiC2 compo...
This contribution deals with fundamental and applied concepts in nano-structured coatings, in partic...
The TiN/Si3N4 coatings were deposited by reactive single target magnetron sputtering. The TiSi10 and...