The role of a simple surface defect, such as a step, for relaxing the stress applied to a semiconductor, has been investigated by means of large-scale first-principles calculations. Our results indicate that the step is the privileged site for initiating plasticity, with the formation and glide of 60 degrees dislocations for both tensile and compressive deformations. We have also examined the effect of surface and step termination on the plastic mechanisms
In this second part, the mechanical behaviour of elemental semiconductors (ESC) and III-V compounds ...
Dislocation core structures in elemental semiconductors (ESC) and III-V compound semiconductors (CSC...
The periodic structure of the shallow trench isolation (STI) type ULSI cells is generally used for t...
Abstract: This manuscript addresses the issue of interaction between a surface step and an edge disl...
A myriad of engineering applications involve contact between two surfaces, which induces localized p...
The influences of surface step state and temperature on the elastic limit for dislocation nucleation...
The nucleation of perfect or partial dislocations from a surface-step of a f.c.c. or diamond-like m...
[著者版]The final, definitive version of this article has been published in the Journal, MATHEMATICS AN...
During this thesis, we have studied the dislocation nucleation from a surface step of a stressed sil...
Au moyen de simulations atomistiques, un mécanisme de formation de dislocation à partir des défauts ...
Four different aspects of the properties of dislocations in monolayer and semiconductors have been i...
This dissertation addresses two aspects of the theory and simulation of stress-diffusion coupling in...
Molecular dynamics analyses of defect-free aluminum single crystals subject to bending are carried o...
The study of the micro-plastic behavior of rough surface contact is the critical link towards a fund...
This dissertation addresses two aspects of the theory and simulation of stress-diffusion coupling in...
In this second part, the mechanical behaviour of elemental semiconductors (ESC) and III-V compounds ...
Dislocation core structures in elemental semiconductors (ESC) and III-V compound semiconductors (CSC...
The periodic structure of the shallow trench isolation (STI) type ULSI cells is generally used for t...
Abstract: This manuscript addresses the issue of interaction between a surface step and an edge disl...
A myriad of engineering applications involve contact between two surfaces, which induces localized p...
The influences of surface step state and temperature on the elastic limit for dislocation nucleation...
The nucleation of perfect or partial dislocations from a surface-step of a f.c.c. or diamond-like m...
[著者版]The final, definitive version of this article has been published in the Journal, MATHEMATICS AN...
During this thesis, we have studied the dislocation nucleation from a surface step of a stressed sil...
Au moyen de simulations atomistiques, un mécanisme de formation de dislocation à partir des défauts ...
Four different aspects of the properties of dislocations in monolayer and semiconductors have been i...
This dissertation addresses two aspects of the theory and simulation of stress-diffusion coupling in...
Molecular dynamics analyses of defect-free aluminum single crystals subject to bending are carried o...
The study of the micro-plastic behavior of rough surface contact is the critical link towards a fund...
This dissertation addresses two aspects of the theory and simulation of stress-diffusion coupling in...
In this second part, the mechanical behaviour of elemental semiconductors (ESC) and III-V compounds ...
Dislocation core structures in elemental semiconductors (ESC) and III-V compound semiconductors (CSC...
The periodic structure of the shallow trench isolation (STI) type ULSI cells is generally used for t...