While standard photolithography methods have proven themselves in semiconductor applications, they have fundamental limitations when considered for the fabrication of advanced micro/nanosystems (MEMS/NEMS). MEMS and NEMS often use “soft” materials such as polymers and functional chemical layers and include 3D surface topography or mechanically fragile parts that are incompatible with standard lithography processing. The stencil method is based on selective deposition of material through shadow masks (resistless). The patterns are transferred to a substrate in a single process step, potentially in a non-contact mode. These specifics make the stencil method applicable to 3D surfaces and surfaces that are either mechanically unstable, such as ...
This paper presents a technique to pattern materials in deep holes and/or on non-planar substrate su...
Evaporation through shadow masks (nanostencils) overcomes the limitations typically given by pattern...
This work aims at developing a new and unconventional Sacrificial Stencil Mask (SSM) technology by e...
Patterning with lithographic processes requires processing steps including the use of resist spinnin...
Shadow mask evaporation is a powerful technique which enables us to make micro- or nano-structures o...
Stencil lithography is an innovative method for patterning that has a great flexibility from many po...
We describe a sub-micron shadow-mask evaporation or nanostencil technique for single-layer material ...
In this paper, we review the current development of stencil lithography for scalable micro- and nano...
In this paper, we review the current development of stencil lithography for scalable micro- and nano...
This work aims at developing a new and unconventional Sacrificial Stencil Mask (SSM) technology by e...
This paper presents a technique to pattern materials in deep holes andor on non-planar substrate sur...
This work aims at developing a new and unconventional Sacrificial Stencil Mask (SSM) technology by e...
A tool and method for flexible and rapid surface patterning technique beyond lithography based on hi...
This paper presents a technique to pattern materials in deep holes andor on non-planar substrate sur...
The endeavour to develop nanodevices demands for patterning methods in the nanoscale. To bring nanod...
This paper presents a technique to pattern materials in deep holes and/or on non-planar substrate su...
Evaporation through shadow masks (nanostencils) overcomes the limitations typically given by pattern...
This work aims at developing a new and unconventional Sacrificial Stencil Mask (SSM) technology by e...
Patterning with lithographic processes requires processing steps including the use of resist spinnin...
Shadow mask evaporation is a powerful technique which enables us to make micro- or nano-structures o...
Stencil lithography is an innovative method for patterning that has a great flexibility from many po...
We describe a sub-micron shadow-mask evaporation or nanostencil technique for single-layer material ...
In this paper, we review the current development of stencil lithography for scalable micro- and nano...
In this paper, we review the current development of stencil lithography for scalable micro- and nano...
This work aims at developing a new and unconventional Sacrificial Stencil Mask (SSM) technology by e...
This paper presents a technique to pattern materials in deep holes andor on non-planar substrate sur...
This work aims at developing a new and unconventional Sacrificial Stencil Mask (SSM) technology by e...
A tool and method for flexible and rapid surface patterning technique beyond lithography based on hi...
This paper presents a technique to pattern materials in deep holes andor on non-planar substrate sur...
The endeavour to develop nanodevices demands for patterning methods in the nanoscale. To bring nanod...
This paper presents a technique to pattern materials in deep holes and/or on non-planar substrate su...
Evaporation through shadow masks (nanostencils) overcomes the limitations typically given by pattern...
This work aims at developing a new and unconventional Sacrificial Stencil Mask (SSM) technology by e...