A capacitively coupled rf plasma is investigated in the context of the heating mechanisms that sustain it under various conditions. These mechanisms are critically dependent on gas pressure, applied rf potential, rf current and discharge gap. Pressure ranges of 10 to 300 mTorr and rf potentials from a few Volts to several hundred Volts are investigated.\ud \ud The argon plasma is generated in two capacitively coupled rf systems. Plasma parameters are measured using a Langmuir probe. A microwave interferometer is used to compare density measurements with that of the probe. A current voltage monitor is used to measure the voltage, current and phase for the purpose of relating the control parameters to the plasma parameters. The design and con...
Low pressure, radio-frequency (rf) glow discharges have been used extensively in plasma processing ...
Low pressure, radio-frequency (rf) glow discharges\ud have been used extensively in plasma processin...
The aim of this thesis is to investigate the properties of a Radio Frequency capacitive discharge at...
A capacitively coupled rf plasma is investigated in the context of the heating mechanisms that susta...
A capacitively coupled rf plasma is investigated in the context of the heating mechanisms that susta...
A capacitively coupled rf plasma is investigated in the context of the heating mechanisms that susta...
Radio frequency generated plasmas are used extensively in commercial manufacturing systems for a ran...
Radio frequency generated plasmas are used extensively in commercial manufacturing systems for a ran...
Radio frequency generated plasmas are used extensively in commercial manufacturing systems for a ran...
Many of today’s processing plasma tools are operated at low pressures to achieve high etch directivi...
Many of today’s processing plasma tools are operated at low pressures to achieve high etch directivi...
Many of today’s processing plasma tools are operated at low pressures to achieve high etch directivi...
Many of today’s processing plasma tools are operated at low pressures to achieve high etch directivi...
Low pressure, radio-frequency (rf) glow discharges have been used extensively in plasma processing ...
Low pressure, radio-frequency (rf) glow discharges have been used extensively in plasma processing ...
Low pressure, radio-frequency (rf) glow discharges have been used extensively in plasma processing ...
Low pressure, radio-frequency (rf) glow discharges\ud have been used extensively in plasma processin...
The aim of this thesis is to investigate the properties of a Radio Frequency capacitive discharge at...
A capacitively coupled rf plasma is investigated in the context of the heating mechanisms that susta...
A capacitively coupled rf plasma is investigated in the context of the heating mechanisms that susta...
A capacitively coupled rf plasma is investigated in the context of the heating mechanisms that susta...
Radio frequency generated plasmas are used extensively in commercial manufacturing systems for a ran...
Radio frequency generated plasmas are used extensively in commercial manufacturing systems for a ran...
Radio frequency generated plasmas are used extensively in commercial manufacturing systems for a ran...
Many of today’s processing plasma tools are operated at low pressures to achieve high etch directivi...
Many of today’s processing plasma tools are operated at low pressures to achieve high etch directivi...
Many of today’s processing plasma tools are operated at low pressures to achieve high etch directivi...
Many of today’s processing plasma tools are operated at low pressures to achieve high etch directivi...
Low pressure, radio-frequency (rf) glow discharges have been used extensively in plasma processing ...
Low pressure, radio-frequency (rf) glow discharges have been used extensively in plasma processing ...
Low pressure, radio-frequency (rf) glow discharges have been used extensively in plasma processing ...
Low pressure, radio-frequency (rf) glow discharges\ud have been used extensively in plasma processin...
The aim of this thesis is to investigate the properties of a Radio Frequency capacitive discharge at...