Optimization of Active Vibration Control of a Laser Pattern Generator in Micro Lithography

The extreme precision requirements in semiconductor manufacturing drive the need for an active vibration isolation system in a laser pattern generator. Optimization has been performed and evaluated in a model using a high level programming tool [1]. The areas of optimization were 1) Decoupling strategies for decentralized control and 2) Improved feed forward control. Only a limited description of the model itself is given here. More about the model is presented in [2] and [3].QC 20120321