Add to ORKGDue to the character of the original source materials and the nature of batch digitization, quality control issues may be present in this document. Please report any quality issues you encounter to digital@library.tamu.edu, referencing the URI of the item.Bibliography: leaves 43-44.Not availabl
This item was digitized from a paper original and/or a microfilm copy. If you need higher-resolution...
The effect of stress in silicon nitride films on boron diffusion of silicon has been studied. Dur in...
An investigation into the effects of masking oxide on the diffusion of boron into silicon has been m...
Due to the character of the original source materials and the nature of batch digitization, quality ...
Due to the character of the original source materials and the nature of batch digitization, quality ...
Hot-pressed 93 % boron nitride wafers when properly oxidized and used as an in situ boron dopant in ...
220 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2007.The work seeks to study the e...
The effects of bulk microdefects and metallic impurities on leakage currents at p-n junctions have b...
Due to the character of the original source materials and the nature of batch digitization, quality ...
We have shown that energy contamination introduced by ion beam deceleration technology that is used ...
Due to the character of the original source materials and the nature of batch digitization, quality ...
Due to the character of the original source materials and the nature of batch digitization, quality ...
Due to the character of the original source materials and the nature of batch digitization, quality ...
International audienceThe presence of capping materials during annealing (activation for example) ca...
Due to the character of the original source materials and the nature of batch digitization, quality ...
This item was digitized from a paper original and/or a microfilm copy. If you need higher-resolution...
The effect of stress in silicon nitride films on boron diffusion of silicon has been studied. Dur in...
An investigation into the effects of masking oxide on the diffusion of boron into silicon has been m...
Due to the character of the original source materials and the nature of batch digitization, quality ...
Due to the character of the original source materials and the nature of batch digitization, quality ...
Hot-pressed 93 % boron nitride wafers when properly oxidized and used as an in situ boron dopant in ...
220 p.Thesis (Ph.D.)--University of Illinois at Urbana-Champaign, 2007.The work seeks to study the e...
The effects of bulk microdefects and metallic impurities on leakage currents at p-n junctions have b...
Due to the character of the original source materials and the nature of batch digitization, quality ...
We have shown that energy contamination introduced by ion beam deceleration technology that is used ...
Due to the character of the original source materials and the nature of batch digitization, quality ...
Due to the character of the original source materials and the nature of batch digitization, quality ...
Due to the character of the original source materials and the nature of batch digitization, quality ...
International audienceThe presence of capping materials during annealing (activation for example) ca...
Due to the character of the original source materials and the nature of batch digitization, quality ...
This item was digitized from a paper original and/or a microfilm copy. If you need higher-resolution...
The effect of stress in silicon nitride films on boron diffusion of silicon has been studied. Dur in...
An investigation into the effects of masking oxide on the diffusion of boron into silicon has been m...