Research Status on Influences of Insulating Substrates on Chemical Vapor Deposition of Graphene

Graphene has caught wide attention due to its unique and excellent properties since its first isolation in 2004. Due to its outstanding performance such as high carrier mobility, high elasticity and optical transparency, graphene is expected to become the potential functional material which is applied to semiconductor industry. Although metal-catalyzed chemical vapor deposition could achieve the grown graphene replaced the underlying dielectric substrates by the post-removal of metal, it still cannot avoid the metal contaminations or damage of graphene film. It is necessary to prepare a graphene film which directly grows on an insulating substrate, when the graphene is used in electronic devices. Herein, the recent progress and some important research results in graphene directly grown on insulating substrates are introduced, and further applications based on graphene are briefly introduced