This research investigates complex studies of electrical conductivity and magnetoresistance of both strain and non-strain samples of p-type Si whiskers with different degrees of doping with boron and nickel in a wide temperature range from 4.2 to 300 K. It is established that the greatest manifestation of the piezoresistive effect is observed in the vicinity of concentrations which correspond to the metal-insulator transition. Investigation of the magnetoresistance of crystals was carried out in the range of fields with induction up to 14 T. Whiskers of silicon with a doping concentration of boron of 5·1018 cm-3 can be used as a sensitive element for two-functional deformation and magnetic field sensors in difficult operating conditions. M...
Reduction in the skin effect for the sintered Si nanopolycrystalline body as an electricity conducto...
A new theoretical model for piezoresistance in both n- and p-type polycrystalline silicon is describ...
The zero-temperature conductivity of Si:B with dopant concentrations near the metal-insulator transi...
Results of the studies of the low-temperature piezoresistance for p-type silicon microcrystals doped...
Sensitive element of multifunctional sensor for measuring temperature, strain and magnetic field ind...
One of the promising directions of development of information and measuring systems for monitoring a...
To create low-temperature strain gauges based on p-type silicon whiskers tensoresistive characterist...
Conductance and magnetoresistance of Si whiskers with diameters 5-40 µm doped with boron impurity ...
A novel metal-induced lateral crystallization (MILC) technology has been applied to the formation of...
The magnetoresistance of GeхSi1-х (x = 0.002 ¸ 0.11) whiskers with an acceptor concentration(Na = 3....
A full investigation into the piezoresistive effect in polycrystalline silicon is described. A theor...
The paper presents results of the research concerning microindentation of physical and mechanical pr...
International audienceThis paper presents strain sensor arrays on flexible substrates able to measur...
Microcrystalline silicon films are used as piezoresistive material to fabricate resistor and transis...
Magnetic shape memory properties of polycrystalline Ni50Mn 35In15-xSix were investigated. A reversib...
Reduction in the skin effect for the sintered Si nanopolycrystalline body as an electricity conducto...
A new theoretical model for piezoresistance in both n- and p-type polycrystalline silicon is describ...
The zero-temperature conductivity of Si:B with dopant concentrations near the metal-insulator transi...
Results of the studies of the low-temperature piezoresistance for p-type silicon microcrystals doped...
Sensitive element of multifunctional sensor for measuring temperature, strain and magnetic field ind...
One of the promising directions of development of information and measuring systems for monitoring a...
To create low-temperature strain gauges based on p-type silicon whiskers tensoresistive characterist...
Conductance and magnetoresistance of Si whiskers with diameters 5-40 µm doped with boron impurity ...
A novel metal-induced lateral crystallization (MILC) technology has been applied to the formation of...
The magnetoresistance of GeхSi1-х (x = 0.002 ¸ 0.11) whiskers with an acceptor concentration(Na = 3....
A full investigation into the piezoresistive effect in polycrystalline silicon is described. A theor...
The paper presents results of the research concerning microindentation of physical and mechanical pr...
International audienceThis paper presents strain sensor arrays on flexible substrates able to measur...
Microcrystalline silicon films are used as piezoresistive material to fabricate resistor and transis...
Magnetic shape memory properties of polycrystalline Ni50Mn 35In15-xSix were investigated. A reversib...
Reduction in the skin effect for the sintered Si nanopolycrystalline body as an electricity conducto...
A new theoretical model for piezoresistance in both n- and p-type polycrystalline silicon is describ...
The zero-temperature conductivity of Si:B with dopant concentrations near the metal-insulator transi...