Potassium hydroxide (KOR) etching was used to create four sided pyramids for potential use in vacuum microelectronic devices. Optimal structures were found to be approximately 2 microns on a side and 2.2 microns high. KOM etched the silicon at 1200 A/mm in the vertical direction. A slight overetch period insured that the oxide mask was undercut completely away and the pyramids came to a sharp point, but were not attacked. Surface damage as a result of the KOH etching was minimal
Submitted on behalf of EDA Publishing Association (http://irevues.inist.fr/handle/2042/5920)Internat...
The authors present a method to pattern etch masks for arbitrary nano- and microstructures on differ...
A novel approach to the design and fabrication of field-emission tips with self-aligned gates intend...
Potassium hydroxide (KOR) etching was used to create four sided pyramids for potential use in vacuum...
In the 1980’s science and technology have pushed towards miniaturization. In order to interface to t...
Abstract. The texturization of monocrystalline silicon wafers using a mixture of potassium hydroxide...
peer reviewedWe report in this work the fabrication and optical characterization of micromirrors wit...
Microelectromechanical System (MEMS) are systems of micron-sized structures and typically integrated...
A two step silicon surface texturing, consisting of potassium hydroxide (KOH) etching followed by te...
The purpose of this project is to investigate the suitability of wet etching methods such as KOH etc...
A periodically ordered, truncated pyramid array of a single-crystal silicon was readily fabricated b...
In the fabrication of complicated MEMS inertial sensors, there are many instances where metallisatio...
In wet anisotropic etching based silicon bulk micromachining, undercutting, which has both advantage...
Submitted on behalf of TIMA Editions (http://irevues.inist.fr/tima-editions)Advances in material pro...
Advances in material processing such as silicon micromachining are opening the way to vacuum microel...
Submitted on behalf of EDA Publishing Association (http://irevues.inist.fr/handle/2042/5920)Internat...
The authors present a method to pattern etch masks for arbitrary nano- and microstructures on differ...
A novel approach to the design and fabrication of field-emission tips with self-aligned gates intend...
Potassium hydroxide (KOR) etching was used to create four sided pyramids for potential use in vacuum...
In the 1980’s science and technology have pushed towards miniaturization. In order to interface to t...
Abstract. The texturization of monocrystalline silicon wafers using a mixture of potassium hydroxide...
peer reviewedWe report in this work the fabrication and optical characterization of micromirrors wit...
Microelectromechanical System (MEMS) are systems of micron-sized structures and typically integrated...
A two step silicon surface texturing, consisting of potassium hydroxide (KOH) etching followed by te...
The purpose of this project is to investigate the suitability of wet etching methods such as KOH etc...
A periodically ordered, truncated pyramid array of a single-crystal silicon was readily fabricated b...
In the fabrication of complicated MEMS inertial sensors, there are many instances where metallisatio...
In wet anisotropic etching based silicon bulk micromachining, undercutting, which has both advantage...
Submitted on behalf of TIMA Editions (http://irevues.inist.fr/tima-editions)Advances in material pro...
Advances in material processing such as silicon micromachining are opening the way to vacuum microel...
Submitted on behalf of EDA Publishing Association (http://irevues.inist.fr/handle/2042/5920)Internat...
The authors present a method to pattern etch masks for arbitrary nano- and microstructures on differ...
A novel approach to the design and fabrication of field-emission tips with self-aligned gates intend...