分别采用电阻热蒸发和电子束热蒸发的方法,在石英基底上制备了十几种用于紫外光区的氧化物和氟化物单层膜,通过测其在200~2000 nm波段内的透射率,计算出了这些膜材料在从紫外到红外波段内的折射率n和消光系数k的色散曲线,并由Tauc作图法求出了材料的带隙。Some single-layer films of different materials used in the ultraviolet region, which include oxide and fluoride, have been made on the fused silica substrate by resistive heating evaporation or electron beam bombardment technique. According to their transmissivity in 200 ~ 2000 nm, dispersion curves of these materials refractive index n and extinction coefficient k are obtained. Then their band gap through Tauc plot method and cut-off wavelengths are got
On développe une théorie générale, du deuxième ordre par rapport à l'épaisseur et à la rugosité supe...
Studies of thin films in the Extreme Ultraviolet (EUV) are difficult given that most materials readi...
Both the optical and physical properties of thin film optical interference coatings depend upon the ...
运用电子束、离子辅助和离子束溅射三种镀膜工艺分别制备光学薄膜,包括单层氧化物薄膜和增透膜,然后采取一系列测试手段,如Zygo轮廓仪、原子力显微镜、表面热透镜技术和X射线衍射等技术,来分析和研究不同的工...
[[abstract]]The determination of optical constants of thin films is an important requirement for the...
Physical vapor deposition is the most common technique used to deposit optical thin films for a larg...
利用磁控溅射法,在不同的工艺条件下制备氮化钛薄膜。详细分析了不同工艺条件下薄膜的光谱选择特性以及相应的光学常数,通过俄歇电子能谱对薄膜的不同深度的元素成分进行了分析,由原子力显微镜测量并处理得到氮化钛...
After reviewing the principle of the method for determining, in the far ultraviolet, the optical con...
Research into an optical thin film coating that enhances the current design of lithographic excimer ...
Bu tez çalışması kapsamında ince film optik kaplamalar üzerine araştırma ve geliştirme faaliyetleri ...
A description is given of an apparatus for evaporation under ultra-high vacuum (5 × 10—10 Torr) of t...
研究了真空紫外光学薄膜的沉积方法,用热舟蒸发制备了LaF3, NdF3, GdF3高折射率材料单层膜和MgF2, A1F3, Na3A1F6低折射率材料单层膜,研究了基底温度和沉积速率对薄膜微观结构的...
The optical parameters (index of refraction and extinction coefficients—n and k) of various dielectr...
This project intends to study thin films of scandium oxide in the extreme ultraviolet. The goal is t...
The determination of fundamental optical parameters is essential for the development of new optical ...
On développe une théorie générale, du deuxième ordre par rapport à l'épaisseur et à la rugosité supe...
Studies of thin films in the Extreme Ultraviolet (EUV) are difficult given that most materials readi...
Both the optical and physical properties of thin film optical interference coatings depend upon the ...
运用电子束、离子辅助和离子束溅射三种镀膜工艺分别制备光学薄膜,包括单层氧化物薄膜和增透膜,然后采取一系列测试手段,如Zygo轮廓仪、原子力显微镜、表面热透镜技术和X射线衍射等技术,来分析和研究不同的工...
[[abstract]]The determination of optical constants of thin films is an important requirement for the...
Physical vapor deposition is the most common technique used to deposit optical thin films for a larg...
利用磁控溅射法,在不同的工艺条件下制备氮化钛薄膜。详细分析了不同工艺条件下薄膜的光谱选择特性以及相应的光学常数,通过俄歇电子能谱对薄膜的不同深度的元素成分进行了分析,由原子力显微镜测量并处理得到氮化钛...
After reviewing the principle of the method for determining, in the far ultraviolet, the optical con...
Research into an optical thin film coating that enhances the current design of lithographic excimer ...
Bu tez çalışması kapsamında ince film optik kaplamalar üzerine araştırma ve geliştirme faaliyetleri ...
A description is given of an apparatus for evaporation under ultra-high vacuum (5 × 10—10 Torr) of t...
研究了真空紫外光学薄膜的沉积方法,用热舟蒸发制备了LaF3, NdF3, GdF3高折射率材料单层膜和MgF2, A1F3, Na3A1F6低折射率材料单层膜,研究了基底温度和沉积速率对薄膜微观结构的...
The optical parameters (index of refraction and extinction coefficients—n and k) of various dielectr...
This project intends to study thin films of scandium oxide in the extreme ultraviolet. The goal is t...
The determination of fundamental optical parameters is essential for the development of new optical ...
On développe une théorie générale, du deuxième ordre par rapport à l'épaisseur et à la rugosité supe...
Studies of thin films in the Extreme Ultraviolet (EUV) are difficult given that most materials readi...
Both the optical and physical properties of thin film optical interference coatings depend upon the ...