Optical Design of Lithography Projective Lens with Variable Total Track

一种用于印刷电路板(PCB)的激光直接成像(LDI)光刻设备,需要加工高密度互连(HDI)基板的厚度变化范围为0.025~3mm,为此设计了一种共轭距可变的光刻投影物镜。采用双远心光路结构,通过压缩物方和像方远心度误差的办法,可以有效地实现共轭距变化范围达3mm。采用正负光焦度合理匹配,可以有效地在共轭距变化范围内很好地校正波像差、畸变等像差,实现良好的成像质量管理中心_期刊论文。以光刻投影物镜光学设计的具体实例,证实了通过压缩物方和像方远心度误差的办法,可以有效地获得共轭距变化一定范围的光刻投影物镜,并在该变化范围内保证实际光刻设备所要求投影物镜的成像质量管理中心_期刊论文。The printed circuit board(PCB),such as the high density interconnection(HDI),can be exposed by the laser direct image(LDI)lithography tool when the thickness range of the HDI substrate is from0.025 mm to 3 mm. Accordingly,it is designed that the total track of a lithography projective lens is variable.The double telecentricity layout is used and the range of variable total track is 3 mm by reduction of double telecentricity error.The image quality of this projective lens,such as wave front error(WFE),distortion and modulation transfer function(MTF), is very good when the range of the variable total track is from0to 3 mm by the reasonable match between positive lenses and negative lenses.It is confirmed that a lithography projective lens with a variable total track is available by this method of reduction of double telecentricity error,and the image quality of this projective lens with the variable total track meet the actual requirements of the LDI lithography tool