Optimized measurements of planarity of the nanostructure surfaces

Supervisor: T.J. KippenbergIn micro- nanofabrication planarity of the surfaces is the key of successful process flow. Defects, caused by processes such as etching, inhomogeneity caused either deposition or sputtering can be detected via special metrology techniques and tools. Detection can be done in two ways: by a digital image comparison technique or by laser scanning technology. Noticeable, that both techniques are used in industry and science. Laser scattering tool mostly destined for blank monitor wafers, as image comparison is for patterned wafers. When you are citing the document, use the following link http://essuir.sumdu.edu.ua/handle/123456789/2759