METHOD OF PRODUCING MICROSTRUCTURES

Abstract of WO 9411788 (A1) The invention relates to method of providing a microstructure in electric conductors, semiconductors and insulators utilizing a multilayer resist system, wherein in the image layer a siliceous polymer comprising chemically unstable side groups, and an initiator are used, which initiator generates, under the influence of radiation, a catalyst which in turn chemically modifies these side groups, the silicon content of this polymer being such that upon treatment with oxygen plasma a closed network of silica is formed on the surface of the polymer, to a multilayer resist system having positive and/or negative tone for producing microstructures, and to siliceous polymers suitable therefo