Si3N4-TiN based micro-laminates with rising R-curve behaviour

Two different Si3N4-TiN based micro-laminates were successfully designed and manufactured (by tape casting) with a rising R-curve behaviour. These laminates were successfully designed to have maximum apparent fracture toughnesses of 10.5 and 18.0 MPa m(1/2). Thin compressive Si3N4 layers of 50 mu m thickness were used to control the residual stresses and hence the apparent fracture toughness in the microlaminates. No 'edge cracking', crack deflection or crack bifurcation was observed in the two designs of micro-laminates studied. (C) 2006 Elsevier Ltd. All rights reserved