The effects of in situ sulphur passivation on the electronic properties of n-type InAs(0 0 1) have been studied using X-ray photoemission spectroscopy and high resolution electron energy loss spectroscopy coupled with space-charge layer calculations. Surfaces passivated by sulphur dosing followed by arsenic capping were annealed in vacuum to progressively remove the protective layers. For disordered surfaces with a sulphur coverage of almost 2 monolayers (ML), complex surface plasmon modes were observed due to strong electron accumulation at the surface, with downward band bending around 600 meV. For (2 x 1) reconstructed surfaces (sulphur coverage <1 ML), the band bending dropped to 325 meV. A 375 degreesC anneal was sufficient to remove a...
Well-ordered clean InAs(1 1 1) A and B surfaces have been prepared using HCl-isopropanol solutions a...
Sputter-induced electronic stales and stoichiometry at the low ion-energy sputter-annealed InAs(110)...
The (4 x 2) epitaxial InAs(001) surface grown by molecular beam epitaxy and subjected to different s...
The passivation of InAs(001) surfaces by exposure to sulphur in ultra-high vacuum (UHV), followed by...
Treatment with ammonium sulfide [(NH4)2Sx] solutions is used to produce model passivated InAs (001) ...
High resolution electron energy loss spectroscopy (HREELS) has been used to study the surface plasmo...
Abstract. Using density functional theory, we have studied surface structural and electronic propert...
High-resolution electron energy-loss spectroscopy (HREELS) has been used to study the surface-plasmo...
InP(100) surfaces were passivated with S using a wet chemical treatment. The structural properties o...
High-resolution electron-energy-loss spectroscopy (HREELS) has been used to study the (001) surface ...
Atomic hydrogen cleaning has been used to produce structurally and electronically damage-free InAs(1...
This thesis is the result of investigations regarding the processes in InAs III-V semiconductor surf...
The electronic properties of n-type narrow gap III-V semiconductor surfaces and interfaces are inves...
The electronic and chemical properties of G aA s(lll) Surfaces have been investigated at Daresbury S...
The electronic properties of n-type narrow gap III-V semiconductor surfaces and interfaces are inves...
Well-ordered clean InAs(1 1 1) A and B surfaces have been prepared using HCl-isopropanol solutions a...
Sputter-induced electronic stales and stoichiometry at the low ion-energy sputter-annealed InAs(110)...
The (4 x 2) epitaxial InAs(001) surface grown by molecular beam epitaxy and subjected to different s...
The passivation of InAs(001) surfaces by exposure to sulphur in ultra-high vacuum (UHV), followed by...
Treatment with ammonium sulfide [(NH4)2Sx] solutions is used to produce model passivated InAs (001) ...
High resolution electron energy loss spectroscopy (HREELS) has been used to study the surface plasmo...
Abstract. Using density functional theory, we have studied surface structural and electronic propert...
High-resolution electron energy-loss spectroscopy (HREELS) has been used to study the surface-plasmo...
InP(100) surfaces were passivated with S using a wet chemical treatment. The structural properties o...
High-resolution electron-energy-loss spectroscopy (HREELS) has been used to study the (001) surface ...
Atomic hydrogen cleaning has been used to produce structurally and electronically damage-free InAs(1...
This thesis is the result of investigations regarding the processes in InAs III-V semiconductor surf...
The electronic properties of n-type narrow gap III-V semiconductor surfaces and interfaces are inves...
The electronic and chemical properties of G aA s(lll) Surfaces have been investigated at Daresbury S...
The electronic properties of n-type narrow gap III-V semiconductor surfaces and interfaces are inves...
Well-ordered clean InAs(1 1 1) A and B surfaces have been prepared using HCl-isopropanol solutions a...
Sputter-induced electronic stales and stoichiometry at the low ion-energy sputter-annealed InAs(110)...
The (4 x 2) epitaxial InAs(001) surface grown by molecular beam epitaxy and subjected to different s...