Atomic force microscopy imaging of chemical vapor deposition WO3 films reveals the presence of domed crystallites that resemble the florets of cauliflowers with a rough surface texture. Annealing at 400degreesC and above leads to further surface roughening, with estimated root mean square roughness values of 40-50 nm. Spectroscopic ellipsometry analysis shows that the surface layer becomes thicker with increasing oxygen flow rate during film deposition. This layer is predominantly amorphous for as-deposited films, and predominantly crystalline after annealing. (C) 2003 Kluwer Academic Publishers
We studied the effect of annealing temperature on the physical properties of WO3 thin films using di...
Transition metal oxides represent a novel class of compounds which have attracted a considerable int...
Tungsten oxide (WO3) has been a subject of high interest for its unique properties, and recently for...
The surface layer formed during chemical vapour deposition (CVD) of tungsten trioxide thin films was...
Thin film of tungsten oxide (WO3) has been extensively studied as an electrochromic material and has...
This study investigates the nanomechanical properties and surface morphology of tungsten oxide WO3th...
Tungsten oxide (WO3) films were deposited on p-type Si (100) substrates using atomic layer depositio...
By resistively heating tungsten filaments in a constant air flow under a reduced pressure, nanogranu...
AbstractThin films of WO3 were deposited on quartz substrates by the RF magnetron sputtering. Differ...
Tungsten trioxide (WO3) is one of the best transparent metal oxides for advanced technological appli...
The electronic, morphological and structural properties of WO3 thin films, synthesized via a sol-gel...
The development of the morphology and surface roughness of amorphous SiO2-like films, on various pol...
Pulsed laser deposition from a compound target in an oxygen atmosphere has been used to produce sub-...
The development of the morphology and surface roughness of amorphous SiO2-like films, on various pol...
AbstractTungsten oxide is deposited by atomic layer deposition (ALD) using tungsten hexacarbonyl [W(...
We studied the effect of annealing temperature on the physical properties of WO3 thin films using di...
Transition metal oxides represent a novel class of compounds which have attracted a considerable int...
Tungsten oxide (WO3) has been a subject of high interest for its unique properties, and recently for...
The surface layer formed during chemical vapour deposition (CVD) of tungsten trioxide thin films was...
Thin film of tungsten oxide (WO3) has been extensively studied as an electrochromic material and has...
This study investigates the nanomechanical properties and surface morphology of tungsten oxide WO3th...
Tungsten oxide (WO3) films were deposited on p-type Si (100) substrates using atomic layer depositio...
By resistively heating tungsten filaments in a constant air flow under a reduced pressure, nanogranu...
AbstractThin films of WO3 were deposited on quartz substrates by the RF magnetron sputtering. Differ...
Tungsten trioxide (WO3) is one of the best transparent metal oxides for advanced technological appli...
The electronic, morphological and structural properties of WO3 thin films, synthesized via a sol-gel...
The development of the morphology and surface roughness of amorphous SiO2-like films, on various pol...
Pulsed laser deposition from a compound target in an oxygen atmosphere has been used to produce sub-...
The development of the morphology and surface roughness of amorphous SiO2-like films, on various pol...
AbstractTungsten oxide is deposited by atomic layer deposition (ALD) using tungsten hexacarbonyl [W(...
We studied the effect of annealing temperature on the physical properties of WO3 thin films using di...
Transition metal oxides represent a novel class of compounds which have attracted a considerable int...
Tungsten oxide (WO3) has been a subject of high interest for its unique properties, and recently for...