Study of Local ZnO Nanorods Growth by Using Atomic Force Microscopy

[[abstract]]隨著奈米技術的進步，圖案被轉移到晶片表面或甚至在元件本身可被縮小到奈米範圍內。因此許多電子裝置像是感測器和顯示器都能夠有更好的靈敏度和更好的性能。對場發射元件的應用，有時只需要在晶片表面上的一些選定區域生長或沉積奈米柱。傳統上，是利用微影技術將所要成長的局部區域定義出來，再將奈米柱再生長在局部區域內。然而，這是費時和需要高分辨率的微影蝕刻技術。在本論文中，我們探討利用原子力顯微鏡與用毛細管針尖直接在基板的局部區域上成長出奈米柱而無需使用微影蝕刻技術的可能性。 在本論文中，我們分別利用醋酸鋅及醋酸金的水熱法在矽、二氧化矽及摻氟氧化錫玻璃基板上成長氧化鋅及金奈米柱。我們選擇了不同的莫耳濃度溶液及不同的成長時間等條件，透過具毛細微孔之原子力顯微鏡探針直接點在基板上後來進行奈米柱的成長，並試著找出最佳的成長條件。 我們的研究結果顯示，利用原子力顯微鏡的毛細探針尖進行局部奈米柱成長是可行的，而在三種不同基板上以二氧化矽基板上成長奈米柱會有較佳的結果。我們也發現成長時間為2小時及0.002M的莫濃度可以得到最佳的奈米柱的成長。[[abstract]]With the advancement of nanotechnology, patterns to be transferred to wafer surface or even the device itself can be scaled down to nanometer range. Many electronic equipment such as sensors and display are therefore to be able to have better sensitivity and performances. For the application of filed-emission devices, sometimes it is required to grow or deposit nanorods only on some selected areas on the wafer surface. Traditionally, photolithography is used to pre-define the local areas where the nanorods to be grown. However, this is time consuming and high resolution photolithographic instrument is needed. In this work, we investigate the feasibility of using atomic force microscopy（AFM）with capillary AFM tip to grow ZnO nanorods locally without using photolithography. In this thesis, zinc acetate and gold acetate solutions were separately used to grow zinc oxide and gold nanorods on silicon（Si）, silicon dioxide（SiO2）, and fluorinated tin oxide（FTO）glass substrates, respectively, by hydrothermal method. The solutions were coated onto different local areas by using capillary AFM probe. The nanorods were then grown hydrothermally under different grow conditions including various molar concentration of the growth solution and different growth times. Optimum growth condition was then determined. From our experimental results, it is found that using capillary AFM tip to grow nanorods locally is possible. It is found that the SiO2 substrate is the most suitale substrates for nanorods growth among the three different substrates. It is also found that a growth time of 2hr and a molar concentration of 0.02M is the best condition for the nanorods growth.[[note]]碩