In the work the surface area of the electrode with dispersed copper deposit obtained within 30 seconds was evaluated by techniques of chronopotentiometry (CPM) and impedance spectroscopy. In method CPM the electrode surface available for measurement depends on the value of the polarizing current. At high currents during the transition time there is a change of surface relief that can not determine the full surface of loose deposit. The electrochemical impedance method is devoid of this shortcoming since the measurements are carried out in indifferent electrolyte in the absence of current. The area measured by the impedance is tens of times higher than the value obtained by chronopotentiometry. It is found that from a solution containing sul...
In this paper we present the use of electrochemical impedance spectroscopy measurement as a tool to ...
Differences in electrical conductivity provide a basis for identification of different components pr...
The electropolishing of rotating copper-disk electrodes in concentrated phosphoric acid is studied b...
The application of depletive stripping chronopotentiometry at scanned deposition potential (SSCP) to...
The patination of copper is known for its complexity and heterogeneous formation. For a deeper inves...
In this research, the effect of surface-active substances (CMC and DFP) on the electrolysis of coppe...
In the present work two electrochemical techniques were used to study passivation of a clean copper ...
In metal electrodeposition in the limiting diffusion current density range, the deposition current d...
Plating of steel components with copper prior to nickel and chromium plating is of commercial import...
The problems observed in the instantaneous off potential measurement were attributed to a non-suffic...
The electrochemical deposition of copper has been a major focus of research for decades. Renewed int...
Microelectronics is a new field of interest for electrochemistry as this technology has adopted copp...
Lithographic techniques for microcircuitry leave photoresist materials on copper surfaces which must...
Objective of the present work is the measurement of electrochemical potential data on real surfaces ...
Application of electrochemical impedance measurements to microparticulate deposits of copper corrosi...
In this paper we present the use of electrochemical impedance spectroscopy measurement as a tool to ...
Differences in electrical conductivity provide a basis for identification of different components pr...
The electropolishing of rotating copper-disk electrodes in concentrated phosphoric acid is studied b...
The application of depletive stripping chronopotentiometry at scanned deposition potential (SSCP) to...
The patination of copper is known for its complexity and heterogeneous formation. For a deeper inves...
In this research, the effect of surface-active substances (CMC and DFP) on the electrolysis of coppe...
In the present work two electrochemical techniques were used to study passivation of a clean copper ...
In metal electrodeposition in the limiting diffusion current density range, the deposition current d...
Plating of steel components with copper prior to nickel and chromium plating is of commercial import...
The problems observed in the instantaneous off potential measurement were attributed to a non-suffic...
The electrochemical deposition of copper has been a major focus of research for decades. Renewed int...
Microelectronics is a new field of interest for electrochemistry as this technology has adopted copp...
Lithographic techniques for microcircuitry leave photoresist materials on copper surfaces which must...
Objective of the present work is the measurement of electrochemical potential data on real surfaces ...
Application of electrochemical impedance measurements to microparticulate deposits of copper corrosi...
In this paper we present the use of electrochemical impedance spectroscopy measurement as a tool to ...
Differences in electrical conductivity provide a basis for identification of different components pr...
The electropolishing of rotating copper-disk electrodes in concentrated phosphoric acid is studied b...