We present a simple model to evaluate the sharpness of the band edges for tunnel field-effect transistors by comparing the subthreshold swing and the conductance in the negative differential resistance region. This model is evaluated using experimental data from InAs/InGaAsSb/GaSb nanowire tunnel-field effect transistors with the ability to reach a subthreshold swing well below the thermal limit. A device with the lowest subthreshold swing, 43 mV/decade at 0.1 V, exhibits also the sharpest band-edge decay parameter E0 of 43.5 mV although in most cases the S<<E0. The model explains the observed temperature dependence of the subthreshold swing
Single gate oxide defects in strongly scaled Tunneling Field-Effect Transistors with an inverse subt...
InAs/GaSb and similar materials systems have generated great interest as a heterojunction for tunnel...
In this work, we present a novel method to reduce the subthreshold swing of field-effect transistors...
© 2018 IEEE. The tunnel field-effect transistor (TFET) is one of the prime steep-slope device candi...
With voltage scaling to reduce power consumption in scaled transistors the subthreshold swing is bec...
© 2017 IEEE. I. Introduction The growing demand for power efficient devices has accelerated the rese...
The tunnel field effect transistor (TFET) has the potential to operate at lower voltages and lower p...
We provide a detailed study of the oxide- semiconductor interface trap assisted tunneling (TAT) mech...
The minimum energy of the first conduction subband varies with gate voltage in trigate silicon-on-in...
This paper analyzes the subthreshold swing in asymmetric double gate MOSFETs with sub-20 nm channel ...
Over the last decades, the continuous down-scaling of metal-oxide-semiconductor field-effect transis...
Over the last decades, the continuous down-scaling of metal-oxide-semiconductor field-effect transis...
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Materials Science and Engineeri...
The requirements placed upon next-generation devices include high on-state current, low power supply...
With the scaling of MOSFET devices down to the sub-10 nm regime, there has been an active search for...
Single gate oxide defects in strongly scaled Tunneling Field-Effect Transistors with an inverse subt...
InAs/GaSb and similar materials systems have generated great interest as a heterojunction for tunnel...
In this work, we present a novel method to reduce the subthreshold swing of field-effect transistors...
© 2018 IEEE. The tunnel field-effect transistor (TFET) is one of the prime steep-slope device candi...
With voltage scaling to reduce power consumption in scaled transistors the subthreshold swing is bec...
© 2017 IEEE. I. Introduction The growing demand for power efficient devices has accelerated the rese...
The tunnel field effect transistor (TFET) has the potential to operate at lower voltages and lower p...
We provide a detailed study of the oxide- semiconductor interface trap assisted tunneling (TAT) mech...
The minimum energy of the first conduction subband varies with gate voltage in trigate silicon-on-in...
This paper analyzes the subthreshold swing in asymmetric double gate MOSFETs with sub-20 nm channel ...
Over the last decades, the continuous down-scaling of metal-oxide-semiconductor field-effect transis...
Over the last decades, the continuous down-scaling of metal-oxide-semiconductor field-effect transis...
Thesis: Ph. D., Massachusetts Institute of Technology, Department of Materials Science and Engineeri...
The requirements placed upon next-generation devices include high on-state current, low power supply...
With the scaling of MOSFET devices down to the sub-10 nm regime, there has been an active search for...
Single gate oxide defects in strongly scaled Tunneling Field-Effect Transistors with an inverse subt...
InAs/GaSb and similar materials systems have generated great interest as a heterojunction for tunnel...
In this work, we present a novel method to reduce the subthreshold swing of field-effect transistors...