Add to ORKGTitanium oxide (TiO2) thin films devoted to biomedical application were obtained by the chemical vapour deposition method. The films were deposited on titanium substrate using a low-pressure reactor with various precursor molar fractions and deposition temperatures. The influence of these parameters on film properties xas studied by using electron microscopy images, roughness measuring, X-ray diffraction, contact angle measuring and cyclic polarisation tests
Titanium and its alloys have been widely used for dental implants due to their excellent combination...
In this work we report the synthesis of TiO2 thin films by the Organometallic Chemical Vapor Deposit...
A new titanium precursor, [Ti(OPri)2(deacam)2] (deacam\u2009=\u2009N,N-diethylacetoacetamide), was d...
Titanium is still the most commonly used metal material to manufacture orthopaedic prostheses on acc...
TiO2 thin films with various morphologies were grown on Ti substrates by the LP-MOCVD technique (Low...
Titanium oxide (TiO2) thin films were obtained using the MOCVD method. In this report we discuss the...
Filmes finos de TiO2 foram crescidos sobre silício (100) através do processo de deposição química de...
Titanium oxide (TiO2) thin films were obtained using the MOCVD method. In this report we discuss the...
International audienceIn situ chemical surface analyses using X-ray photoelectron spectroscopy (XPS)...
Three differently treated titanium substrates to be used in dental implant applications and with dif...
An examination of the possibility of applying pulse pressure metalorganic chemical vapour deposition...
Among the techniques developed for depositing thin films, metal-organic chemical vapor deposition is...
The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MO...
In this work we report the synthesis of TiO2 thin films by the Organometallic Chemical Vapor Deposit...
Des films de TiO2 variant par le teneur relative en anatase et en rutile, par la rugosité, par la mo...
Titanium and its alloys have been widely used for dental implants due to their excellent combination...
In this work we report the synthesis of TiO2 thin films by the Organometallic Chemical Vapor Deposit...
A new titanium precursor, [Ti(OPri)2(deacam)2] (deacam\u2009=\u2009N,N-diethylacetoacetamide), was d...
Titanium is still the most commonly used metal material to manufacture orthopaedic prostheses on acc...
TiO2 thin films with various morphologies were grown on Ti substrates by the LP-MOCVD technique (Low...
Titanium oxide (TiO2) thin films were obtained using the MOCVD method. In this report we discuss the...
Filmes finos de TiO2 foram crescidos sobre silício (100) através do processo de deposição química de...
Titanium oxide (TiO2) thin films were obtained using the MOCVD method. In this report we discuss the...
International audienceIn situ chemical surface analyses using X-ray photoelectron spectroscopy (XPS)...
Three differently treated titanium substrates to be used in dental implant applications and with dif...
An examination of the possibility of applying pulse pressure metalorganic chemical vapour deposition...
Among the techniques developed for depositing thin films, metal-organic chemical vapor deposition is...
The synthesis of TiO2 thin films was carried out by the Organometallic Chemical Vapor Deposition (MO...
In this work we report the synthesis of TiO2 thin films by the Organometallic Chemical Vapor Deposit...
Des films de TiO2 variant par le teneur relative en anatase et en rutile, par la rugosité, par la mo...
Titanium and its alloys have been widely used for dental implants due to their excellent combination...
In this work we report the synthesis of TiO2 thin films by the Organometallic Chemical Vapor Deposit...
A new titanium precursor, [Ti(OPri)2(deacam)2] (deacam\u2009=\u2009N,N-diethylacetoacetamide), was d...