Fast MTF measurement of CMOS imagers at the chip level using ISO 12233 slanted-edge methodology

MTF measurement methods for imaging devices usually require the use of an optical system to project the image of the object onto the detector. So, MTF results quality strongly depends on the accuracy of the optical adjustments (alignments, focusing…). Dedicated edge patterns have been implemented at the chip level on a CMOS imager. One of them emulates the target used in the ISO 12233 slanted-edge technique and the others one are inspired by the knife-edge method. This allows to get the MTF data without optical focusing. In order to validate the results, comparisons have been made between MTF measurements using these patterns and results obtained through direct measurements with the transmissive slanted-edge target and sine target