Atomic Layer Deposition for Nano-manufacturing

Atomic Layer Deposition (ALD) enables the fabrication of highly uniform and conformal thin films, and as such, has been adopted in a number of leading edge technologies. Due to the unique deposition process, ALD films can overcome challenges faced by traditional deposition techniques, such as conformaly depositing films less than 10nm, functionalizing difficult materials (such as plastics and graphene), and coating high-aspect ratio structures (such as DRAM trenches or porous materials). In this talk, an overview of the ALD reaction sequence, fundamentals and select applications developed by Cambridge NanoTech users will be presented. Examples of these applications include the use of ALD films for gate oxides and TCOs, as well as merging organic and inorganics for use in flexible electronics, OLEDs and biomaterials. The relative ease in scaling ALD processes from R&D to production will be discussed