The incorporation of fluorine into photoresist materials imparts a variety of highly desirable properties for deep ultraviolet lithography at 193 nm and 157 nm. Chief amongst these benefits are the high optical transparency of partially fluorinated materials and the high acidity of fluorocarbinols. Yet, significant challenges remain to incorporate the large amount of fluorine necessary for high transparency into functionalized norbornene monomers without adversely affecting transition metal polymerization processes. Chapters 2 details the synthesis and characterization of a series of partially fluorinated tricyclo[4.2.1.0(2,5)]non-7-ene (TCN) monomers. The fused cyclobutane ring serves as an additional scaffold onto which additional f...
We have developed a family of 157 nm resists that utilize fluorinated terpolymer resins composed of ...
The work described in this thesis was concerned with the synthesis and metathesis ring .opening poly...
A new technique for direct patterning of functional organic polymers using commercial photolithograp...
Fluorocarbon polymers and siloxane-based polymers have been identified as promising resist candidate...
Fluorinated tricyclo[4.2.1.0^(2,5)]non-7-ene-3-carboxylic acid esters are shown to undergo metal-cat...
ABSTRACT: Novel norbornene and [4.2.1.02,5]tricyclononene monomers bearing two hexafluoro-2-propanol...
textThe design of 157 nm materials for photolithography presented many challenges, stemming from th...
Three metal-catalyzed vinyl addition copolymers derived from partially fluorinated norbornenes and t...
The goal or this work has been to study candidate fluorocarbon materials that might serve as platfor...
textAdvances in microelectronic devices have relied heavily on improved photolithographic imaging c...
Photolithography at 157 nm requires development of new photoresists that are highly transparent at t...
textFluorinated norbornene monomers exhibit the requisite properties for inclusion in 157 nm photore...
ABSTRACT: Twenty-two tricyclo[4.2.1.02,5]non-7-ene (TCN) or 3-oxatricyclononene monomers, having flu...
Implementation f 157 nm lithography using single-layer photoresists will require the development of ...
textThe microelectronics industries’ ability to keep pace with Moore’s law (the doubling of the num...
We have developed a family of 157 nm resists that utilize fluorinated terpolymer resins composed of ...
The work described in this thesis was concerned with the synthesis and metathesis ring .opening poly...
A new technique for direct patterning of functional organic polymers using commercial photolithograp...
Fluorocarbon polymers and siloxane-based polymers have been identified as promising resist candidate...
Fluorinated tricyclo[4.2.1.0^(2,5)]non-7-ene-3-carboxylic acid esters are shown to undergo metal-cat...
ABSTRACT: Novel norbornene and [4.2.1.02,5]tricyclononene monomers bearing two hexafluoro-2-propanol...
textThe design of 157 nm materials for photolithography presented many challenges, stemming from th...
Three metal-catalyzed vinyl addition copolymers derived from partially fluorinated norbornenes and t...
The goal or this work has been to study candidate fluorocarbon materials that might serve as platfor...
textAdvances in microelectronic devices have relied heavily on improved photolithographic imaging c...
Photolithography at 157 nm requires development of new photoresists that are highly transparent at t...
textFluorinated norbornene monomers exhibit the requisite properties for inclusion in 157 nm photore...
ABSTRACT: Twenty-two tricyclo[4.2.1.02,5]non-7-ene (TCN) or 3-oxatricyclononene monomers, having flu...
Implementation f 157 nm lithography using single-layer photoresists will require the development of ...
textThe microelectronics industries’ ability to keep pace with Moore’s law (the doubling of the num...
We have developed a family of 157 nm resists that utilize fluorinated terpolymer resins composed of ...
The work described in this thesis was concerned with the synthesis and metathesis ring .opening poly...
A new technique for direct patterning of functional organic polymers using commercial photolithograp...