This paper presents the Hot Carrier Endurance of a High Voltage (100V) self aligned Floating lateral nDMOS transistor. Based on experimental results, a Safe Operating Area is determined according to maximum 10% shift of electrical parameters within 25 years. Process/Device simulation has been done in order to understand the degradation phenomena based on bulk current. Two points of high Impact Ionization rates have been found : one close to the channel junction but in depth, and the second one in the drift region. This later explains the Hot Carrier Degradation of the Ron parameter observed experimentally
International audienceThe transistor performances and hot-carrier reliability in n-MOSFETs are inves...
The impact of hot-carrier (HC) stress on thin gate oxide PD SOI nMOSFETs is investigated by analyzin...
This letter studies the effects of hot carrier stress (HCS) in laterally diffused silicon-on-insulat...
This paper presents the Hot Carrier Endurance of a High Voltage (100V) self aligned Floating lateral...
[[abstract]]In this study, hot-carrier stresses in high-voltage (HV) lateral diffused metal-oxide-se...
[[abstract]]In this study, hot-carrier stresses in high-voltage (HV) lateral diffused metal-oxide-se...
One of the main problems encountered when scaling down is the hot carrier induced degradation of MOS...
International audienceThe hot-carrier (HC) degradation of short-channel n-FinFETs is investigated. T...
In this paper, hot carrier degradation is shortly explained, measurements are shown for degradation ...
In this paper the degradation in the drain current and threshold voltage of the N-MOS transistors ar...
The hot-carrier degradation of large angle tilt implanted drain (LATID) NMOSFETs of a 0.35 μm CMOS t...
In this thesis, an integrated simulation approach is presented for estimating the hot-carrier induce...
The hot-carrier degradation of large angle tilt implanted drain (LATID) NMOSFETs of a 0.35 μm CMOS t...
Among the large variety of semiconductor devices addressed to power applications, laterally diffused...
The goals of the research work presented in this thesis are to model submicron pMOS transistor hot-c...
International audienceThe transistor performances and hot-carrier reliability in n-MOSFETs are inves...
The impact of hot-carrier (HC) stress on thin gate oxide PD SOI nMOSFETs is investigated by analyzin...
This letter studies the effects of hot carrier stress (HCS) in laterally diffused silicon-on-insulat...
This paper presents the Hot Carrier Endurance of a High Voltage (100V) self aligned Floating lateral...
[[abstract]]In this study, hot-carrier stresses in high-voltage (HV) lateral diffused metal-oxide-se...
[[abstract]]In this study, hot-carrier stresses in high-voltage (HV) lateral diffused metal-oxide-se...
One of the main problems encountered when scaling down is the hot carrier induced degradation of MOS...
International audienceThe hot-carrier (HC) degradation of short-channel n-FinFETs is investigated. T...
In this paper, hot carrier degradation is shortly explained, measurements are shown for degradation ...
In this paper the degradation in the drain current and threshold voltage of the N-MOS transistors ar...
The hot-carrier degradation of large angle tilt implanted drain (LATID) NMOSFETs of a 0.35 μm CMOS t...
In this thesis, an integrated simulation approach is presented for estimating the hot-carrier induce...
The hot-carrier degradation of large angle tilt implanted drain (LATID) NMOSFETs of a 0.35 μm CMOS t...
Among the large variety of semiconductor devices addressed to power applications, laterally diffused...
The goals of the research work presented in this thesis are to model submicron pMOS transistor hot-c...
International audienceThe transistor performances and hot-carrier reliability in n-MOSFETs are inves...
The impact of hot-carrier (HC) stress on thin gate oxide PD SOI nMOSFETs is investigated by analyzin...
This letter studies the effects of hot carrier stress (HCS) in laterally diffused silicon-on-insulat...