In this paper, charging induced damage (CID) to metal-insulator-metal capacitors (MIMC) is reported. The damage is caused by the build up of a voltage potential difference between the two plates of the capacitor. A simple logarithmic relation is discovered between the damage by this voltage potential and the ratio of the area of the exposed antennas connected to the plates of the MIMC. This function allows anticipation of damage in MIMC devices with long interconnects. The source of the damage is still the subject of further investigatio
In this work, the connection between the generation of catastrophic breakdown (BD) spots in metal-in...
In this work, Metal-insulator-metal (MIM) capacitor structures are fabricated in a technology using ...
Dielectric charging at low electric fields is characterized on radio-frequency microelectromechanica...
In this paper, charging induced damage (CID) to metal-insulator-metal capacitors (MIMC) is reported....
Acknowledgments to G. Groeseneken and G. Van den Bosch from IMEC for the valuable inputs. In this pa...
In this paper, charging induced damage (CID) to metal-insulator-metal capacitors (MIMCs), is reporte...
In this paper, new complex-antenna charging test structures are designed with antennas connected to ...
In this paper, charging induced damage (CID) to metal-insulator-metal-capacitator (MIMC), is reporte...
This work provides an innovative understanding of MIM capacitor degradation behavior under a wide ra...
The connection between the spatial location of catastrophic breakdown spots occurring in metal-insul...
The connection between the spatial location of catastrophic breakdown spots occurring in metal-insul...
In this paper, strategics to cope with plasma charging damage in design and layout phases are discus...
Abs/mct- In this paper, strategies to cope with plasma charging damage in design and layout phases a...
While capacitive radio frequency microelectromechanical (RF MEM) switches are poised to provide a lo...
When maintaining quality of a metal-insulator-metal capacitor process, it is important to fully unde...
In this work, the connection between the generation of catastrophic breakdown (BD) spots in metal-in...
In this work, Metal-insulator-metal (MIM) capacitor structures are fabricated in a technology using ...
Dielectric charging at low electric fields is characterized on radio-frequency microelectromechanica...
In this paper, charging induced damage (CID) to metal-insulator-metal capacitors (MIMC) is reported....
Acknowledgments to G. Groeseneken and G. Van den Bosch from IMEC for the valuable inputs. In this pa...
In this paper, charging induced damage (CID) to metal-insulator-metal capacitors (MIMCs), is reporte...
In this paper, new complex-antenna charging test structures are designed with antennas connected to ...
In this paper, charging induced damage (CID) to metal-insulator-metal-capacitator (MIMC), is reporte...
This work provides an innovative understanding of MIM capacitor degradation behavior under a wide ra...
The connection between the spatial location of catastrophic breakdown spots occurring in metal-insul...
The connection between the spatial location of catastrophic breakdown spots occurring in metal-insul...
In this paper, strategics to cope with plasma charging damage in design and layout phases are discus...
Abs/mct- In this paper, strategies to cope with plasma charging damage in design and layout phases a...
While capacitive radio frequency microelectromechanical (RF MEM) switches are poised to provide a lo...
When maintaining quality of a metal-insulator-metal capacitor process, it is important to fully unde...
In this work, the connection between the generation of catastrophic breakdown (BD) spots in metal-in...
In this work, Metal-insulator-metal (MIM) capacitor structures are fabricated in a technology using ...
Dielectric charging at low electric fields is characterized on radio-frequency microelectromechanica...