Amorphous Silicon Nitride: a suitable alloy for optical multilayered structures
- Ricciardi, Carlo
- Ballarini, V.
- Galli, M.
- Liscidini, M.
- Andreani, L.C.
- Losurdo, M.
- Bruno, G.
- Lettieri, S.
- Gesuele, F.
- Maddalena, P.
- Giorgis, Fabrizio
Publication date
January 2006
DOI ISSN
0022-3093 Citation count (estimate)
22Abstract
a-Si1xNx:H thin films grown by PECVD in a wide compositional range were characterized by spectroscopic ellipsometry and Mach-Zehnder interferometry. Taking advantage from their optical properties, the alloys were fruitfully applied for stratified structures such as distributed Bragg reflectors, conventional and double resonance optical microcavitie
Add to ORKG