Add to ORKGTemperature sensitive poly(methyl methacrylate) (PMMA) optical fibres were coated with boron doped-anatase crystalline TiO2 thin films in a one-step atmospheric pressure-plasma enhanced chemical vapour deposition (AP-PECVD) process. Both the undoped and interstitial boron-doped TiO2 thin films showed photoactivity under UV irradiation, with the boron-doped thin films presenting higher photodegradation rates when compared to the undoped samples
Thin films of TiO2 and boron-nitrogen (B/N) co-doped TiO 2 on glass substrates have been prepared by...
TiO2 thin coatings were prepared, on various substrates, through evaporation of metallic titanium in...
In this work, we have investigated the potential dual application of TiO2 thin films as a photocatal...
The work presented here describes the preparation of transparent interstitial boron-doped TiO2 thin-...
Thin films of interstitial boron-doped anatase TiO2, with varying B concentrations, were deposited v...
Anatase, a form of titanium dioxide (TiO2), is arguably the most studied wide band gap semiconductin...
Boron doped TiO(2) thin films have been successfully deposited on glass substrate and silicon wafer ...
N-doped TiO2 films were deposited by atmospheric pressure CVD from titanium tetra-isopropoxide (TTIP...
Photocatalytically active, N-doped TiO2 thin films were prepared by low pressure metalorganic chemic...
Boron-doped TiO2 (B-TiO2) nanocatalysts were prepared by the sol-gel method, characterized by X-Ray ...
A series of nanostructured boron-TiO2 photocatalysts (B-X-TiO2-T) were prepared by sol–gel synthesis...
Thin films of interstitial boron-doped anatase TiO<sub>2</sub>, with varying B concentrations, were ...
AbstractAtmospheric-pressure chemical vapour deposition (APCVD) was used to produce a series of nitr...
TiO2 thin films were deposited under atmospheric pressure by MOCVD in the temperature range 400–600 ...
This thesis details the use of Aerosol Assisted Chemical Vapour Deposition (AACVD) to synthesise dop...
Thin films of TiO2 and boron-nitrogen (B/N) co-doped TiO 2 on glass substrates have been prepared by...
TiO2 thin coatings were prepared, on various substrates, through evaporation of metallic titanium in...
In this work, we have investigated the potential dual application of TiO2 thin films as a photocatal...
The work presented here describes the preparation of transparent interstitial boron-doped TiO2 thin-...
Thin films of interstitial boron-doped anatase TiO2, with varying B concentrations, were deposited v...
Anatase, a form of titanium dioxide (TiO2), is arguably the most studied wide band gap semiconductin...
Boron doped TiO(2) thin films have been successfully deposited on glass substrate and silicon wafer ...
N-doped TiO2 films were deposited by atmospheric pressure CVD from titanium tetra-isopropoxide (TTIP...
Photocatalytically active, N-doped TiO2 thin films were prepared by low pressure metalorganic chemic...
Boron-doped TiO2 (B-TiO2) nanocatalysts were prepared by the sol-gel method, characterized by X-Ray ...
A series of nanostructured boron-TiO2 photocatalysts (B-X-TiO2-T) were prepared by sol–gel synthesis...
Thin films of interstitial boron-doped anatase TiO<sub>2</sub>, with varying B concentrations, were ...
AbstractAtmospheric-pressure chemical vapour deposition (APCVD) was used to produce a series of nitr...
TiO2 thin films were deposited under atmospheric pressure by MOCVD in the temperature range 400–600 ...
This thesis details the use of Aerosol Assisted Chemical Vapour Deposition (AACVD) to synthesise dop...
Thin films of TiO2 and boron-nitrogen (B/N) co-doped TiO 2 on glass substrates have been prepared by...
TiO2 thin coatings were prepared, on various substrates, through evaporation of metallic titanium in...
In this work, we have investigated the potential dual application of TiO2 thin films as a photocatal...