The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissible interconnect widths and spaces to a small set of discrete values with some interdependencies, so that traditional interconnect sizing by continuous-variable optimization techniques becomes impossible. We present a dynamic programming (DP) algorithm for simultaneous sizing and spacing of all wires in interconnect bundles (or bus structures), yielding the optimal power-delay tradeoff curve. It sets the width and spacing of all interconnects simultaneously, thus finding the global optimum. The DP algorithm is generic and can handle a variety of power-delay objectives, such as total power or delay, or weighted sum of both, power-delay product, ...
This thesis proposes a graph-based maze routing and buffer insertion algorithm for nanometer Very La...
This thesis proposes a graph-based maze routing and buffer insertion algorithm for nanometer Very La...
As process nodes continue to shrink to improve transistor density and performance, it is causing an ...
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissibl...
Interconnect power and delay optimization by dynamic programming in gridded design rule
In this paper, we present an algorithm for delay minimization of interconnect trees by simultaneous ...
Interconnect design has emerged as one of the major challenges facing chip designers as VLSI manufac...
This book covers layout design and layout migration methodologies for optimizing multi-net wire stru...
Abstract—This paper addresses the critical problem of global wire optimization for nanometer scale v...
The problem of optimal space allocation among interconnecting wires of VLSI chips, in order to minim...
In this paper, we study the optimal wiresizing problem under the distributed Elmore delay model. We ...
The growth of computer performance by Moore's law is currently limited by power consumption and wast...
As the continuous trend of Very Large Scale Integration (VLSI) circuits technol-ogy scaling and freq...
In this paper, we study the simultaneous transistor and interconnect sizing (STIS) problem. We defin...
In this paper, we develop a set of delay estimation models with consideration of various interconnec...
This thesis proposes a graph-based maze routing and buffer insertion algorithm for nanometer Very La...
This thesis proposes a graph-based maze routing and buffer insertion algorithm for nanometer Very La...
As process nodes continue to shrink to improve transistor density and performance, it is causing an ...
The lithography used for 32 nanometers and smaller VLSI process technologies restricts the admissibl...
Interconnect power and delay optimization by dynamic programming in gridded design rule
In this paper, we present an algorithm for delay minimization of interconnect trees by simultaneous ...
Interconnect design has emerged as one of the major challenges facing chip designers as VLSI manufac...
This book covers layout design and layout migration methodologies for optimizing multi-net wire stru...
Abstract—This paper addresses the critical problem of global wire optimization for nanometer scale v...
The problem of optimal space allocation among interconnecting wires of VLSI chips, in order to minim...
In this paper, we study the optimal wiresizing problem under the distributed Elmore delay model. We ...
The growth of computer performance by Moore's law is currently limited by power consumption and wast...
As the continuous trend of Very Large Scale Integration (VLSI) circuits technol-ogy scaling and freq...
In this paper, we study the simultaneous transistor and interconnect sizing (STIS) problem. We defin...
In this paper, we develop a set of delay estimation models with consideration of various interconnec...
This thesis proposes a graph-based maze routing and buffer insertion algorithm for nanometer Very La...
This thesis proposes a graph-based maze routing and buffer insertion algorithm for nanometer Very La...
As process nodes continue to shrink to improve transistor density and performance, it is causing an ...