Thin films of Cobalt(II) Oxide were deposited from equimolar concentrations of Cobalt Chloride, and Hexamethylene-tetramine on clean glass substrates using the Aqueous Chemical Growth method in order to determine the effect of pre-cursor concentration on their optical and solid state properties. The analytical tools used for the study include, Ruther-ford Back Scattering (RBS) spectroscopy for elemental analysis and determination of film thickness, X-Ray Difftraction (XRD) for crystallographic structure, a UV-VIS spectrophotometer for optical and other solid state properties and a photomicroscope for photomicrographs. The results indicate that an increase in the concentration of precursor materials makes ACG CoO thin film a better absorber ...
In this paper, we introduce a new Co precursor for the atomic layer deposition (ALD) of Co metal and...
In this report we present the growth process of the cobalt oxide system using reactive electron beam...
Cobalt oxide thin films were deposited by spray pyrolysis method onto a glass substrate at 300?C sub...
Semi conducting thin films of cobalt oxide (CoO) and copper oxide (CuO) were successfully deposited ...
In this work, chemical bath deposition technique was used to deposit thin films of cobalt sulphide o...
Thin films of cobalt oxide have been deposited on various substrates, such as glass, Si(100). SrTiO3...
Thin films of cobalt oxide have been deposited on various substrates, such as glass, Si(100). SrTiO3...
Thin films of cobalt oxide have been deposited on various substrates, such as glass, Si(100), SrTiO3...
Nanocrystalline films of cobalt oxide have been prepared on glass slides by chemical bath deposition...
For the first time, cobalt oxide films that are highly protective against localized corrosion and de...
In this work, chemical bath deposition technique was used to deposit thin films of cobalt sulphide o...
WOS: 000499678700013Cobalt oxide films have been produced by chemical bath deposition technique at v...
In this paper, we introduce a new Co precursor for the atomic layer deposition (ALD) of Co metal and...
In this report we present the growth process of the cobalt oxide system using reactive electron beam...
In this paper, we introduce a new Co precursor for the atomic layer deposition (ALD) of Co metal and...
In this paper, we introduce a new Co precursor for the atomic layer deposition (ALD) of Co metal and...
In this report we present the growth process of the cobalt oxide system using reactive electron beam...
Cobalt oxide thin films were deposited by spray pyrolysis method onto a glass substrate at 300?C sub...
Semi conducting thin films of cobalt oxide (CoO) and copper oxide (CuO) were successfully deposited ...
In this work, chemical bath deposition technique was used to deposit thin films of cobalt sulphide o...
Thin films of cobalt oxide have been deposited on various substrates, such as glass, Si(100). SrTiO3...
Thin films of cobalt oxide have been deposited on various substrates, such as glass, Si(100). SrTiO3...
Thin films of cobalt oxide have been deposited on various substrates, such as glass, Si(100), SrTiO3...
Nanocrystalline films of cobalt oxide have been prepared on glass slides by chemical bath deposition...
For the first time, cobalt oxide films that are highly protective against localized corrosion and de...
In this work, chemical bath deposition technique was used to deposit thin films of cobalt sulphide o...
WOS: 000499678700013Cobalt oxide films have been produced by chemical bath deposition technique at v...
In this paper, we introduce a new Co precursor for the atomic layer deposition (ALD) of Co metal and...
In this report we present the growth process of the cobalt oxide system using reactive electron beam...
In this paper, we introduce a new Co precursor for the atomic layer deposition (ALD) of Co metal and...
In this paper, we introduce a new Co precursor for the atomic layer deposition (ALD) of Co metal and...
In this report we present the growth process of the cobalt oxide system using reactive electron beam...
Cobalt oxide thin films were deposited by spray pyrolysis method onto a glass substrate at 300?C sub...