Chemical Methods for the Deposition of Thin Films of Bi2S3

Thin film preparation by chemical deposition is presently attracting considerable attention as it is relatively inexpensive, simple and conve-nient for large areas deposition of II-VI, IV-VI, I-III-VI etc. compound thin films. A variety of substrates like insulator, semiconductor, metal etc can be used since it is a low temperature process. The preparative parameters are easily controllable and better orientation of crystalli-tes and improved grain structure can be obtained (1-3). Using chemical deposition, polycrystallin