The reaction of titanium tetraisopropoxide with 2 equiv of N,N-diethyl acetoacetamide affords Ti(OiPr)2(CH3COCHCONEt2)2 (1) as colorless crystals in 80 % yield. Compound 1 is characterized by spectroscopic (Mass and 1H/13C NMR) and microanalytical data. Molecular structure of 1 has been determined by a single crystal X-ray diffraction study, which reveals that it is a monomeric, cis-diisopropoxide and contains a six coordinate Ti(IV) atom with a cis(CONEt2), trans(COCH3) configuration (1a) in a distorted octahedral environment. Variable-temperature 1H NMR spectra of 1 indicate that it exists as an equilibrium mixture of cis, trans (1a) and cis, cis (1b) isomers in a 0.57: 0.43 ratio at −20 oC in toluene-d8 solution. Thermal properties of 1 ...
The modification of titanium alkoxides by chemical reactions with ligands yields complexes or molecu...
TiO2 thin films were deposited under atmospheric pressure by MOCVD in the temperature range 400–600 ...
TiO2 thin films were deposited on Si(100) and steel substrates by Pyrosol technique. The layer morph...
A new titanium precursor, [Ti(OPri)2(deacam)2] (deacam\u2009=\u2009N,N-diethylacetoacetamide), was d...
Novel, volatile, stable, oxo-β-ketoesterate complexes of titanium, whose synthesis requires only an ...
The design, synthesis and characterization of several MOCVD precursors for TiO\(_{2}\) have been car...
Heteroleptic titanium alkoxides with three different ligands, i.e., [Ti((OPr)-Pr-i)(X)(Y)] (X = trid...
Thin films of $TiO_{2}$ have been deposited on glass substrates by metalorganic chemical vapour depo...
A tailored precursor namely bis(isopropoxy)bis(tert-butylacetoacetato)titanium [Ti(OPri)(2)(tbaoac)(...
Two novel Group IV precursors, titanium (IV) neo-pentoxide, [Ti({mu}-ONep)(ONep){sub 3}]{sub 2} (l),...
A comprehensive examination of the feasibility of producing new titania precursors by ligand substit...
International audienceThe photocatalytic properties of titanium dioxide TiO2 thin films, a seminal s...
International audienceTiO2 thin films were deposited under atmospheric pressure by MOCVD in the temp...
In this research, pure anatase phase titanium dioxide thin films were successfully fabricated for th...
Among the techniques developed for depositing thin films, metal-organic chemical vapor deposition is...
The modification of titanium alkoxides by chemical reactions with ligands yields complexes or molecu...
TiO2 thin films were deposited under atmospheric pressure by MOCVD in the temperature range 400–600 ...
TiO2 thin films were deposited on Si(100) and steel substrates by Pyrosol technique. The layer morph...
A new titanium precursor, [Ti(OPri)2(deacam)2] (deacam\u2009=\u2009N,N-diethylacetoacetamide), was d...
Novel, volatile, stable, oxo-β-ketoesterate complexes of titanium, whose synthesis requires only an ...
The design, synthesis and characterization of several MOCVD precursors for TiO\(_{2}\) have been car...
Heteroleptic titanium alkoxides with three different ligands, i.e., [Ti((OPr)-Pr-i)(X)(Y)] (X = trid...
Thin films of $TiO_{2}$ have been deposited on glass substrates by metalorganic chemical vapour depo...
A tailored precursor namely bis(isopropoxy)bis(tert-butylacetoacetato)titanium [Ti(OPri)(2)(tbaoac)(...
Two novel Group IV precursors, titanium (IV) neo-pentoxide, [Ti({mu}-ONep)(ONep){sub 3}]{sub 2} (l),...
A comprehensive examination of the feasibility of producing new titania precursors by ligand substit...
International audienceThe photocatalytic properties of titanium dioxide TiO2 thin films, a seminal s...
International audienceTiO2 thin films were deposited under atmospheric pressure by MOCVD in the temp...
In this research, pure anatase phase titanium dioxide thin films were successfully fabricated for th...
Among the techniques developed for depositing thin films, metal-organic chemical vapor deposition is...
The modification of titanium alkoxides by chemical reactions with ligands yields complexes or molecu...
TiO2 thin films were deposited under atmospheric pressure by MOCVD in the temperature range 400–600 ...
TiO2 thin films were deposited on Si(100) and steel substrates by Pyrosol technique. The layer morph...