Add to ORKGA general ized mass transport model is developed for predict ing the rate of deposition in chemical vapor deposition (C~/D) systems. This combines the general ized method of obtaining equi l ibr ium composition, with elemental flux balance expressions. This procedure avoids the usual problems encountered in calculating the rates in mult icomponent systems, l ike writ ing overal l reaction schemes. The dependence of mult icomponent diffusivities on the fluxes is ac-counted in this model using an i terat ive procedure. The model developed i
Abstract. The purpose of this article is to present, for the chemical vapour deposition process, mas...
Includes bibliographical references (pages 47-48)A collisional model for describing the transient co...
The shortcomings of earlier approaches that assumed thermochemical equilibrium and used chemical vap...
A generalized mass transport model is developed for predicting the rate ofdeposition in chemical vap...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1989.Science ...
We describe a numerical model of the coupled gas-phase hydrodynamics and chemical kinetics in a sili...
A steady-state, two-dimensional mass conservation equation for a surface reaction is theoretically a...
A numerical model that combines mass transport and surface kinetics was applied, for the first time,...
Over the years, the design of chemical vapor deposition processes has relied on accumulated empirica...
Chemical vapor deposition (CVD) is a process for producing solid particles from volatile precursors ...
peer reviewedAn efficient CFD model for the deposition of alumina from a gas mixture consisting of A...
Contains fulltext : mmubn000001_154126756.pdf (publisher's version ) (Open Access)...
Abstract. In this paper we present a kinetic model based on numerical simulations of a chemical vapo...
The formalism for the accurate modeling of chemical vapor deposition (CVD) processes has matured bas...
ABSTRACT Carbon coated optical fibers are produced by the chemical vapor deposition process which in...
Abstract. The purpose of this article is to present, for the chemical vapour deposition process, mas...
Includes bibliographical references (pages 47-48)A collisional model for describing the transient co...
The shortcomings of earlier approaches that assumed thermochemical equilibrium and used chemical vap...
A generalized mass transport model is developed for predicting the rate ofdeposition in chemical vap...
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 1989.Science ...
We describe a numerical model of the coupled gas-phase hydrodynamics and chemical kinetics in a sili...
A steady-state, two-dimensional mass conservation equation for a surface reaction is theoretically a...
A numerical model that combines mass transport and surface kinetics was applied, for the first time,...
Over the years, the design of chemical vapor deposition processes has relied on accumulated empirica...
Chemical vapor deposition (CVD) is a process for producing solid particles from volatile precursors ...
peer reviewedAn efficient CFD model for the deposition of alumina from a gas mixture consisting of A...
Contains fulltext : mmubn000001_154126756.pdf (publisher's version ) (Open Access)...
Abstract. In this paper we present a kinetic model based on numerical simulations of a chemical vapo...
The formalism for the accurate modeling of chemical vapor deposition (CVD) processes has matured bas...
ABSTRACT Carbon coated optical fibers are produced by the chemical vapor deposition process which in...
Abstract. The purpose of this article is to present, for the chemical vapour deposition process, mas...
Includes bibliographical references (pages 47-48)A collisional model for describing the transient co...
The shortcomings of earlier approaches that assumed thermochemical equilibrium and used chemical vap...