Optical Methods in Orientation of High-Purity

Copyright © 2013 Guojian Wang et al. This is an open access article distributed under the Creative Commons Attribution License, which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. Two optical methods, namely crystal facet reflection and etching pits reflection, were used to orient <100> and <111> high-purity germanium crystals. The X-ray diffraction patterns of three slices that were cut from the oriented <100> and <111> crystals were measured by X-ray diffraction. The experimental errors of crystal facet reflection method and etching pits reflection method are in the range of 0.05 ˚- 0.12˚. The crystal facet reflection method and etching pits re-flection method are extremely simple and cheap and their accuracies are acceptable for characterizing high purity de-tector-grade germanium crystals